Tokyo Electron Limited

Kazuto Umeki

Kousuke Yoshihara

Suguru Enokida

Kazuhiro Takeshita

Eiichi Sekimoto

Kenichi Shigetomi

Takeshi Saikusa

Takayuki Fukudome

A substrate processing apparatus includes plural heating modules each including a table on which a substrate is placed to be heated, the substrate having plural heated zones. The table has plural heaters each assigned to heat respective ones of the heated zones. Heat generation of the heaters is controlled independently. A control unit controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from first to second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules. The first time point is set when a temperature transition profile of the substrate is rising toward a process temperature after placing the substrate on the table under a condition where heat generation of the heaters is stable. The second time point is set after the temperature transition profile reaches the process temperature.

Substrate processing apparatus and method of adjusting substrate processing apparatus

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Hsin-Chu, Taiwan

Kazuto Umeki