Kabushiki Kaisha Toshiba

Sigma Corporation

Kaoru Kanda

Yasuo Matsuoka

Kenichi Taniyama

Katsuhisa Mita

Tsuneo Akasaki

Michirou Takano

Kunihiko Kanda

A photomask substrate, which is formed in a rectangular shape and on the surface of which photoresist is applied, is located above a lower heating plate so as to be separated from the lower heating plate by a proximity distance. The lower heating plate is provided with a heat unifying ring fixedly arranged thereon so as to surround the photomask substrate. The periphery of the heat unifying ring is provided with a taper section tapered at a predetermined angle to the periphery. The heat unifying ring has a container for containing the photomask substrate, at the central portion. An upper heating plate is arranged above the lower heating plate. The upper heating plate is provided with a baking chamber thereabove to cover the entire portion of the baking chamber section, thereby the baking chamber section can be shielded from the outside and free from the influence of the outside.

Method for baking photoresist applied on substrate

Apparatus for baking photoresist applied on substrate

A method for detecting an endpoint of development including the steps of; forming a resist layer on a conductive layer formed on a substrate; exposing the resist layer by using light, X-rays, or electron beams; forming one electrode by connecting a connector consisting of a first conductive material to the conductive layer through the exposed resist layer on the substrate; forming another electrode by dipping an assembly consisting of a second conductive material into a developing solution; and developing the exposed resist layer while monitoring the current flowing between two electrodes.

Method for detecting endpoint of development

An appliance for adhering a sensing marker on a medium for recording information, such as a magnetic tape, comprising a case, removing rotor, and a guide way. The case has a cavity formed therein where the removing rotor is pivotally supported. The removing rotor also has a cavity therein where a marker roll is accommodated which is commercially available and which includes a backing liner and a plurality of pre-cut sensing markers adhered on the backing liner. The removing rotor has a station which is formed in a flat surface for receiving the backing liner withdrawn from the marker roll. An arc surface and a radial step are also provided with the removing roller. A location is formed on the case so that the magnetic tape is positioned there. A transfer block which has a rectangular shape is formed at the bottom thereof. Soft material which has a tendency to stick to the sensing marker is positioned on the block. The block is pressed to the sensing marker positioned on the flat surface of the removing rotor so that the sensing marker sticks to the soft material mounted on the block. Thereafter, the block together with the sensing marker is pressed to the magnetic tape and the sensing marker is adhered to the tape.

Appliance for adhering a sensing marker on a medium for recording

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Yokohama, Japan

Kaoru Kanda