United Microelectronics Corp.

Fujian Jinhua Integrated Circuit Co., Ltd.

Kai-Jiun Chang

Yi-Wei Chen

Tsun-Min Cheng

Chih-Chieh Tsai

Pin-Hong Chen

Yi-An Huang

Tzu-Chieh Chen

Chia-Chen Wu

Chih-Chien Liu

Chun-Chieh Chiu

Tzu-Hao Liu

Chi-Mao Hsu

Wei-Hsin Liu

Ji-Min Lin

Li-Wei Feng

Hsin-Fu Huang

Ying-Chiao Wang

Chia-Lung Chang

Jui-Min Lee

Chung-Yen Feng

Po-Chih Wu

Shih-Fang Tzou

A method for fabricating buried word line of a dynamic random access memory (DRAM) includes the steps of: forming a trench in a substrate; forming a first conductive layer in the trench; forming a second conductive layer on the first conductive layer, in which the second conductive layer above the substrate and the second conductive layer below the substrate comprise different thickness; and forming a third conductive layer on the second conductive layer to fill the trench.

Buried word line of a dynamic random access memory and method for fabricating the same

The present invention provides a storage node contact structure of a memory device comprising a substrate having a dielectric layer comprising a recess, a first tungsten metal layer, and an adhesive layer on the first tungsten metal layer and a second tungsten metal layer on the adhesive layer, wherein the second tungsten metal layer is formed by a physical vapor deposition (PVD).

Storage node contact structure of a memory device

A method for fabricating semiconductor device includes the steps of first forming a silicon layer on a substrate and then forming a metal silicon nitride layer on the silicon layer, in which the metal silicon nitride layer includes a bottom portion, a middle portion, and a top portion and a concentration of silicon in the top portion is greater than a concentration of silicon in the middle portion. Next, a conductive layer is formed on the metal silicon nitride layer and the conductive layer, the metal silicon nitride layer, and the silicon layer are patterned to form a gate structure.

Semiconductor device and method for fabricating the same

A semiconductor device includes a gate structure on a substrate, in which the gate structure includes a silicon layer on the substrate, a titanium nitride (TiN) layer on the silicon layer, a titanium (Ti) layer between the TiN layer and the silicon layer, a metal silicide between the Ti layer and the silicon layer, a titanium silicon nitride (TiSiN) layer on the TiN layer, and a conductive layer on the TiSiN layer.

A method of forming a semiconductor structure includes providing a material layer having a recess formed therein. A first tungsten metal layer is formed at a first temperature and fills the recess. An anneal process at a second temperature is then performed, wherein the second temperature is higher than the first temperature.

Method of forming a semiconductor structure

Storage node contact structure of a memory device and manufacturing methods thereof

A method of fabricating a cobalt silicide layer includes providing a substrate disposed in a chamber. A deposition process is performed to form a cobalt layer covering the substrate. The deposition process is performed when the temperature of the substrate is between 50&#xb0; C. and 100&#xb0; C., and the temperature of the chamber is between 300&#xb0; C. and 350&#xb0; C. After the deposition process, an annealing process is performed to transform the cobalt layer into a cobalt silicide layer. The annealing process is performed when the substrate is between 300&#xb0; C. and 350&#xb0; C., and the duration of the annealing process is between 50 seconds and 60 seconds.

Fabricating method of cobalt silicide layer coupled to contact plug

A method for fabricating semiconductor device includes the steps of: forming a titanium nitride (TiN) layer on a silicon layer; performing a first treatment process by reacting the TiN layer with dichlorosilane (DCS) to form a titanium silicon nitride (TiSiN) layer; forming a conductive layer on the TiSiN layer; and patterning the conductive layer, the metal silicon nitride layer, and the silicon layer to form a gate structure.

A method for manufacturing a semiconductor device with a cobalt silicide film is provided in the present invention. The method includes the steps of providing a silicon structure with an interlayer dielectric formed thereon, forming a contact hole in the interlayer dielectric to expose the silicon structure, depositing a cobalt film on the exposed silicon structure at a temperature between 300&#xb0; C.-400&#xb0; C., wherein a cobalt protecting film is in-situ formed on the surface of the cobalt film, performing a rapid thermal process to transform the cobalt film into a cobalt silicide film, and removing untransformed cobalt film.

Method for manufacturing a semiconductor device with a cobalt silicide film

A method for fabricating semiconductor device includes the steps of: forming a silicon layer on a substrate; forming a metal silicon nitride layer on the silicon layer; forming a stress layer on the metal silicon nitride layer; performing a thermal treatment process; removing the stress layer; forming a conductive layer on the metal silicon nitride layer; and patterning the conductive layer, the metal silicon nitride layer, and the silicon layer to form a gate structure.

Method for fabricating semiconductor device

A semiconductor memory device is provided, and which includes a substrate, plural gates, plural plugs, a capacitor structure and a conducting cap layer. The gates are disposed within the substrate, and the plugs are disposed on the substrate, with each plug electrically connected to two sides of each gate on the substrate. The capacitor structure is disposed on the substrate, and the capacitor structure includes plural capacitors, with each capacitor electrically connected to the plugs respectively. The conducting cap layer covers the top surface and sidewalls of the capacitor structure. Also, the semiconductor memory device further includes an adhesion layer and an insulating layer. The adhesion layer covers the conducting cap layer and the capacitor structure, and the insulating layer covers the adhesion layer.

Semiconductor memory device

A method of forming dynamic random access memory (DRAM) device, comprises the following steps. First of all, a plurality of active areas is formed in a substrate along a first direction. Next, a plurality of buried gates disposed in the substrate is formed along a second trench extending along a second direction across the first direction. Then, a plurality of bit lines is formed over the buried gates and extended along a third direction across the first direction and the second direction, wherein each of the bit lines comprises a polysilicon layer, a barrier layer and a metal layer and the barrier layer is formed through a radio frequency physical vapor deposition (RF-PVD) process.

Method of forming dynamic random access memory device

A method for fabricating semiconductor device includes the steps of: forming a silicon layer on a substrate; forming a first metal silicon nitride layer on the silicon layer; performing an oxygen treatment process to form an oxide layer on the first metal silicon nitride layer; forming a second metal silicon nitride layer on the oxide layer; forming a conductive layer on the second metal silicon nitride layer; and patterning the conductive layer, the second metal silicon nitride layer, the oxide layer, the first metal silicon nitride layer, and the silicon layer to form a gate structure.

Growing community of inventors

Taoyuan, Taiwan

Kai-Jiun Chang