Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh

Adv Antest Corporation

Siemens Aktiengesellschaft

Applied Materials Israel Limited

Act Advanced Circuit Testing Gesellschaft Fur Testsystementwicklung Mbh

Technische Universiteit Delft

Ict Integrated Circuit Testing Gesellschaft

Act Advanced Circuit Testing Gesellschaft Fur Testsystementwicklung

Act Advanced Circuit Testing Gesellschaft Fur

Ebetech Electron-beam Technology Vertriebs Gmbh

Act Advanced Circuit Testing Gesellschaft

Jürgen Frosien

Gilad Almogy

Stefan Lanio

Dieter Winkler

Hans-Peter Feuerbaum

Burkhard Lischke

Benjamin John Cook

Pieter Kruit

Pavel Adamec

Ralf Degenhardt

Ron Naftali

Matthias Brunner

Alan D Brodie

Dror Shemesh

Avishai Bartov

Gerald Schonecker

Reinhold Schmitt

Matthias Firnkes

Rainer Spehr

Fang Zhou

Hans Zimmermann

Toshimichi Iwai

Koshi Ueda

Ralf Schmid

John Breuer

Yacov Elgar

Helmut Banzhof

Klaus Anger

Michael Pomper

Jacob Levin

Gerald Schönecker

Andreas Oelmann

Roman Barday

Akira Kintaka

Yasuo Tokunaga

Johannes Hopster

Hans P Feuerbaum

Steffen Beck

Karl H Herrmann

Andreas Benez

Gerold Schonecker

Michael Schmitt

Helmut Reschke, Deceased

Uli Hoffmann

Jimmy Vishnipolsky

David A Crewe

Shinpei Takeshita

A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary. Two or more electrodes having one opening, e.g. having one opening each, for the primary charged particle beam or the four or more primary beamlets are provided. The charged particle beam device further includes a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets with respect to each other. The charged particle beam device further includes an objective lens unit having three or more electrodes, each electrode having openings for the four or more primary beamlets.

Method for inspecting a specimen and charged particle beam device

An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.

Simplified particle emitter and method of operating thereof

Disclosed herein is charged particle beam device and a a method of operating a charged particle beam device, comprising forming a plurality of focused charged particle beamlets. Charged particles are directed from a charged particle source to a multi-aperture plate. A plurality of beamlets are passed through a plurality of apertures of the multi-aperture plate. The beamlets include an inner beamlet of charged particles and a plurality of outer beamlets of charged particles. The outer beamlets are focused to form a plurality of outer focal points on a virtual ring having a center along an optical axis, the outer beamlets subjected to a field curvature aberration, such that the virtual ring is axially displaced relative to a virtual focal point of an uncompensated inner beamlet. A compensated inner beamlet is focused to a compensated focal point. The inner beamlet is compensated to form the compensated inner beamlet; and the compensated focal point is coplanar with the virtual ring.

Device and method for forming a plurality of charged particle beamlets

A method of inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device is described. The method includes generating a primary charged particle beam with a charged particle beam emitter; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; correcting a field curvature with at least two electrodes, wherein the at least two electrodes include aperture openings; directing the primary charged particle beamlets with a lens towards an objective lens; guiding the primary charged particle beamlets through a deflector array arranged within the lens; wherein the combined action of the lens and the deflector array directs the primary charged particle beamlets through a coma free point of the objective lens; and focusing the primary charged particle beamlets on separate locations on the specimen with the objective lens.

Method for inspecting a specimen and charged particle multi-beam device

The present disclosure provides a method of reducing coma and chromatic aberration in a charged particle beam device for providing a beam tilt of a charged particle beam. The method includes tilting the charged particle beam with a deflection assembly consisting of two or more electrostatic deflection elements, wherein at least one deflection element of the two or more deflection elements is a post-lens deflector, while the charged particle beam is guided through an essentially coma-free z-position of an objective lens, and reducing off-axis chromatic aberrations with a magnetic deflection element, wherein tilting the charged particle beam reduces coma independent of off-axis chromatic aberrations.

Method of reducing coma and chromatic aberration in a charged particle beam device, and charged particle beam device

A multi-beam lens device is described, which includes: a first beam passage for a first charged particle beam formed along a first direction between a first beam inlet of the first beam passage and a first beam outlet of the first beam passage; a second beam passage for a second charged particle beam formed along a second direction between a second beam inlet of the second beam passage and a second beam outlet of the second beam passage, wherein the first direction and the second direction are inclined with respect to each other by an angle (&#x3b1;) of 5&#xb0; or more such that the first beam passage approaches the second beam passage toward the first beam outlet; and a common excitation coil or a common electrode arrangement configured for focussing the first charged particle beam and the second charged particle beam. Further, a charged particle beam device as well as a method of operating a multi-beam lens device are described.

Multi-beam lens device, charged particle beam device, and method of operating a multi-beam lens device

A method for inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device having an optical axis. The method includes generating a primary charged particle beam; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; and correcting a field curvature of the charged particle beam device with a first and a second field curvature correction electrode. The method further includes applying a voltage to the first and to the second field curvature correction electrode. At least one of the field strength provided by the first and the second field curvature correction electrode varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further includes focusing the primary charged particle beamlets on separate locations on the specimen with an objective lens.

The present disclosure provides a charged particle source arrangement for a charged particle beam device. The charged particle source arrangement includes: a first vacuum region and a second vacuum region; a charged particle source in the first vacuum region, wherein the charged particle source is configured to generate a primary charged particle beam; and a membrane configured to provide a gas barrier between the first vacuum region and the second vacuum region, and wherein the membrane is configured to let at least a portion of the primary charged particle beam pass through the membrane, wherein a first vacuum generation device is connectable to the first vacuum region and a second vacuum generation device is connectable to the second vacuum region.

Charged particle source arrangement for a charged particle beam device, charged particle beam device for sample inspection, and method for providing a primary charged particle beam for sample inspection in a charged particle beam

The present disclosure provides a system for imaging a signal charged particle beam emanating from a sample by impingement of a primary charged particle beam. The system includes a detector arrangement having a first detection element for detecting a first signal charged particle sub-beam of the signal charged particle beam originating from a first spot on the sample and a second detection element for detecting a second signal charged particle sub-beam of the signal charged particle beam originating from a second spot on the sample, wherein the first detection element and the second detection element are separated from each other, and signal charged particle optics. The signal charged particle optics includes a coil configured to generate a magnetic field having a magnetic field component parallel to a longitudinal axis of the coil, wherein the magnetic field acts on the first signal charged particle sub-beam and the second signal charged particle sub-beam propagating along the longitudinal axis, and wherein an aspect ratio of the coil is at least 1, and a controller configured to adjust the magnetic field of the coil such that the first signal charged particle sub-beam is directed towards the first detection element and the second signal charged particle sub-beam is directed towards the second detection element.

System for imaging a signal charged particle beam, method for imaging a signal charged particle beam, and charged particle beam device

A charged particle beam device for imaging and/or inspecting a sample is described. The charged particle beam device includes a beam emitter for emitting a primary charged particle beam; and a retarding field device for retarding the primary beam before impinging on the sample, the retarding field device including a magnetic-electrostatic objective lens and a proxy electrode. The charged particle beam device is adapted for guiding the primary beam along an optical axis to the sample for generating secondary particles released from the sample and backscattered particles. The proxy electrode comprises a first opening allowing the passage of the primary beam and at least one second opening for allowing the passage of off-axial backscattered particles. Further, a proxy electrode and a method for imaging and/or inspecting a sample by a charged particle beam are described.

Charged particle beam device and method for inspecting and/or imaging a sample

A charged particle beam device is provided which includes a primary beam source device adapted for generating a primary charged particle beam, a mirror corrector device adapted for providing compensation of spherical and/or chromatic aberrations, a first beam separator adapted for transmitting the primary charged particle beam to the mirror corrector device and for separating the primary charged particle beam from a compensating primary charged particle beam reflected by the mirror corrector device, wherein the first beam separator has a magnetic deflector configured to generate at least one dipole magnetic field, an objective lens adapted for focusing the compensating primary charged particle beam onto a specimen, and a second beam separator adapted for transmitting the compensating primary charged particle beam to the specimen and for separating the compensating primary charged particle beam from a secondary charged particle beam originating from the specimen.

High resolution charged particle beam device and method of operating the same

The present disclosure provides a method for detecting signal charged particles in a charged particle beam device. The method includes emitting a primary charged particle beam, illuminating a specimen with the primary charged particle beam, wherein the primary charged particle beam has a landing energy on the specimen of less than 40 keV, wherein signal charged particles with a first energy spectrum are generated, energy filtering the signal charged particles such that signal charged particles in an energy range from an energy of 85% of the landing energy to 100% propagate for subsequent detection, and detecting the signal charged particles within the energy range using at least one detector.

Method for detecting signal charged particles in a charged particle beam device, and charged particle beam device

A beam separator device () is described. The beam separator device () includes a first deflector () providing a first magnetic deflection field (B) for deflecting a charged particle beam () propagating along a beam entrance axis (A) by a first deflection angle (&#x3b1;); a second deflector () arranged downstream from the first deflector () providing a second magnetic deflection field (B) for deflecting the charged particle beam by a second deflection angle (&#x3b1;) in the direction of an intermediate beam axis (A), wherein the second deflector () is configured for deflecting the charged particle beam () re-entering the beam separator device () along the intermediate beam axis (A) by a third deflection angle (&#x3b1;); a third deflector () arranged downstream from the second deflector () providing a third magnetic deflection field (B) for deflecting the charged particle beam () by a fourth deflection angle (&#x3b1;) in the direction of a beam exit axis (A); a first rotation-free lens to be arranged at a first crossover (X) of the charged particle beam between the first deflector () and the second deflector () for at least partially compensating for a dispersion introduced by at least one of the first deflector and the second deflector; and a second rotation-free lens to be arranged at a second crossover (X) of the charged particle beam between the second deflector () and the third deflector () for at least partially compensating for a dispersion introduced by at least one of the second deflector and the third deflector.

Beam separator device, charged particle beam device and methods of operating thereof

According to an embodiment, a method of operating a charged particle beam device is provided. The charged particle beam device includes a beam separation unit, a first optical component distanced from the beam separation unit and a second optical component distanced from the beam separation unit and distanced from the first optical component. The method includes generating a primary charged particle beam. The method further includes generating a first electric field and a first magnetic field in the beam separation unit. The method further includes guiding the primary charged particle beam through the beam separation unit in which the first electric field and the first magnetic field are generated, wherein a travel direction of the primary charged particle beam leaving the beam separation unit is aligned with a first target axis under the influence of the first electric field and the first magnetic field. The method further includes generating a secondary charged particle beam by impingement of the primary charged particle beam onto a sample. The method further includes separating the secondary charged particle beam from the primary charged particle beam in the beam separation unit, wherein the secondary charged particle beam is deflected under the influence of the first electric field and the first magnetic field to travel from the beam separation unit to the first optical component. The method further includes generating a second electric field and a second magnetic field in the beam separation unit. The method further includes guiding the primary charged particle beam through the beam separation unit in which the second electric field and the second magnetic field are generated, wherein the travel direction of the primary charged particle beam leaving the beam separation unit is aligned with the first target axis under the influence of the second electric field and the second magnetic field. The method further includes separating the secondary charged particle beam from the primary charged particle beam in the beam separation unit, wherein the secondary charged particle beam is deflected under the influence of the second electric field and the second magnetic field to travel from the beam separation unit to the second optical component.

Dome detection for charged particle beam device

A charged particle beam device is described. In one aspect, the charged particle beam device includes a charged particle beam source, and a switchable multi-aperture for generating two or more beam bundles from a charged particle beam which includes: two or more aperture openings, wherein each of the two or more aperture openings is provided for generating a corresponding beam bundle of the two or more beam bundles; a beam blanker arrangement configured for individually blanking the two or more beam bundles; and a stopping aperture for blocking beam bundles. The device further includes a control unit configured to control the individual blanking of the two or more beam bundles for switching of the switchable multi-aperture and an objective lens configured for focusing the two or more beam bundles on a specimen or wafer.

Charged particle beam system and method of operating thereof

Growing community of inventors

Riemerling, Germany

Jürgen Frosien