Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi-science Systems, Ltd.

Hitachi High-tech Science Systems Corporation

Junichi Katane

Sukehiro Ito

Hideo Morishita

Toshihide Agemura

Shinichi Tomita

Teruo Kohashi

Tatsuro Ide

Yoichi Ose

Takashi Ohshima

Tsunenori Nomaguchi

Ryo Hirano

Michio Hatano

Yuta Imai

Chisato Kamiya

Naohiro Kohmu

Mitsugu Sato

Mitsuru Oonuma

Hiroyasu Shichi

Hiroyuki Yamamoto

Akira Omachi

Atsushi Takane

Yusuke Ominami

Momoyo Enyama

Shinsuke Kawanishi

Shigeru Kawamata

Takeshi Ogashiwa

Mitsuo Akatsu

Hiroyuki Komuro

Yuusuke Narita

Takeharu Shichiji

Tomoyasu Hirashima

Michio c/o Hitachi Ltd Int Prop Group Hatano

An activation mechanism is provided in an activation region of an electron gun, and includes a light source deviceconfigured to irradiate a photocathode with excitation light, a heat generating element, an oxygen generation unit configured to generate oxygen by heating the heat generating element, and an emission current meter configured to monitor an emission current generated by electron emission when the photocathodeis irradiated with the excitation light from the light source device. In a surface activation process, the photocathode is irradiated with the excitation light from the light source device, an emission current amount of the photocathode is monitored by the emission current meter, the heat generating element is heated to generate oxygen by the oxygen generation unit, and the heating of the heat generating element is stopped when the emission current amount of the photocathode satisfies a predetermined stop criterion.

Electron beam application device

Provided is a sample image observation device including an SEM and a control system configured to control the SEM. An observation region of a sample is divided into a plurality of sections, and restoration processing is performed on an image which is acquired by irradiating each section with a sparse electron beam, based on scanning characteristics in the section. A reduction in quality of a restored image due to a beam irradiation position deviation caused by a scanning response is prevented and restoration with high accuracy and high throughput under a condition for preventing sample damage is possible.

Sample image observation device and method for same

To implement a charged particle beam device including an iron thin film spin detector. The charged particle beam device includes: a charged particle columnconfigured to perform scanning on a samplewith a charged particle beam; a spin detector including an iron thin film, a plurality of coilsconfigured to magnetize the iron thin film, a conveying lensconfigured to focus, on the iron thin film, secondary electronsemitted from the sample due to irradiation of the charged particle beam, and an electron detectorconfigured to detect backscattered electronsemitted due to the iron thin film being irradiated with the secondary electrons; and a control unitconfigured to control switching of a magnetization direction of the iron thin film in synchronization with scanning of one line with the charged particle beam from the charged particle column.

Charged particle beam device

The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.

Electron gun and electron microscope

An electron beam emitted from a photoexcited electron gun is increased in luminance. An electron gunincludes: a photocathodeincluding a substrateand a photoelectric film; a light sourcethat emits pulsed excitation light; a condenser lensthat focuses the pulsed excitation light toward the photocathode; and an extractor electrodethat faces the photocathode and that accelerates an electron beam generated from the photoelectric film by focusing the pulsed excitation light by the condenser lens, transmitting the pulsed excitation light through the substrate of the photocathode, and causing the pulsed excitation light to be incident on the photocathode. The pulsed excitation light is condensed at different timings at different positions on the photoelectric film of the photocathode.

Electron gun and electron beam application apparatus

A charged particle beam device which prevents an appearance of a shading contrast due to azimuth discrimination and obtains a clear magnetic domain contrast image with a high resolution and a high throughput. The charged particle beam device includes an electron beam source; a sample stage; an objective lens configured to focus electron beams on a sample; a detector that is mounted on a charged particle beam source side with respect to the objective lens and separately detects secondary electrons emitted in azimuth angle ranges of two or more different azimuths for the same observation region; an image processing and image management device including an image processing unit configured to perform synthesis after performing shading correction and contrast adjustment on an image obtained by detecting a first emission azimuth and an image obtained by detecting a second emission azimuth; an image database; and an image display unit.

The invention provides a charged particle beam device that prevents a leakage of an unnecessary magnetic field to a trajectory of a charged particle beam with which a sample is irradiated in a sample observation according to a boosting method. The charged particle beam device includes: a charged particle source configured to generate the charged particle beam with which the sample is irradiated; an object lens configured to generate the magnetic field for focusing the charged particle beam; and a boosting electrode that is provided inside the object lens and to which a voltage for accelerating the charged particle beam is applied. The boosting electrode is formed of a magnetic material.

A scanning electron microscope includes a spin detector configured to measure secondary electron spin polarization of secondary electrons emitted from the sample, and an analysis device configured to analyze secondary electron spin polarization data measured by the spin detector. The analysis device evaluates the strain in the sample by calculating a difference in the secondary electron spin polarization data of adjacent pixels.

Scanning electron microscope

The present invention provides a charged particle beam apparatus capable of efficiently reducing the effect of a residual magnetic field when SEM observation is performed. The charged particle beam apparatus according to the present invention includes a first mode for passing a direct current to a second coil after turning off a first coil, and a second mode for passing an alternating current to the second coil after turning off the first coil.

The present invention realizes a composite charged particle beam apparatus capable of suppressing a leakage magnetic field from a pole piece forming an objective lens of an SEM with a simple structure. The charged particle beam apparatus according to the present invention obtains an ion beam observation image while passing a current to a first coil constituting the objective lens, and performs an operation of reducing the image shift by passing a current to a second coil with a plurality of current values, and determines a current to be passed to the second coil based on a difference between the operations.

Charged particle beam apparatus

A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.

Scanning electron microscope and method for analyzing secondary electron spin polarization

A charged particle beam device includes: a charged particle source that emits a charged particle beam; a boosting electrode disposed between the charged particle source and a sample to form a path of the charged particle beam and to accelerate and decelerate the charged particle beam; a first pole piece that covers the boosting electrode; a second pole piece that covers the first pole piece; a first lens coil disposed outside the first pole piece and inside the second pole piece to form a first lens; a second lens coil disposed outside the second pole piece to form a second lens; and a control electrode formed between a distal end portion of the first pole piece and a distal end portion of the second pole piece to control an electric field formed between the sample and the distal end portion of the second pole piece.

Provided is a charged particle beam device capable of observing the interior and the surface of a sample in a simple manner. This charged particle beam device operates in a transmitted charged particle image mode and a secondary charged particle image mode. In the transmitted charged particle image mode, a transmitted charged particle image is produced on the basis of a detection signal () associated with light emitted from a light-emitting member () that emits light upon being irradiated with transmitted charged particles transmitted through the interior of a sample (). In the secondary charged particle image mode, a secondary charged particle image is produced on the basis of a detection signal () caused by reflected charged particles or secondary charged particles () from the sample ().

Charged particle beam device, image generation method, observation system

The present invention provides a scanning charged particle beam device including a sample chamber () and a detector. The detector has: a function of detecting light at least ranging from the vacuum ultraviolet region to the visible light region, of light () having image information which is obtained by a light emission phenomenon of gas scintillation when the sample chamber is controlled to a low vacuum (1 Pa to 3,000 Pa); and a function of detecting ion currents () having image information which are obtained by cascade amplification of electrons and gas molecules. Accordingly, it becomes possible to realize a device which can deal with observation of various samples. Further, an optimal configuration of the detection unit is devised, to thereby make it possible to add value to an obtained image and provide users in wide-ranging fields with the observation image. In addition, the detector is made usable in combination with a detector for high vacuum, to thereby make it possible to provide wide-ranging users with the image, irrespective of the vacuum mode.

Growing community of inventors

Naka, Japan

Junichi Katane