Canon Kabushiki Kaisha

Fujitsu Corporation

Jun Iwata

Tomoyuki Tezuka

Nobuyuki Endo

Takehito Okabe

Toshihiro Shoyama

Mitsuhiro Yomori

Shinji Kodaira

Yasuhiro Sekine

Kyouhei Watanabe

Koichi Kuroiwa

Takayuki Sumida

Masaki Kurihara

Shoji Taniguchi

Daisuke Shimoyama

Yasuhiro Kawabata

Masao Ishioka

Yoshikazu Yamada

Naoki Inatani

Mariko Furuta

Kei Aoki

A photoelectric conversion apparatus includes a semiconductor substrate including a photoelectric conversion portion, a metal containing portion provided on the semiconductor substrate, an interlayer insulation film arranged on the semiconductor substrate to cover the metal containing portion, a first silicon nitride layer arranged on the photoelectric conversion portion to include a portion lying between the interlayer insulation film and the semiconductor substrate, a silicon oxide film including a portion arranged between the first silicon nitride layer and the photoelectric conversion portion, and a portion arranged between the interlayer insulation film and the metal containing portion, a second silicon nitride layer arranged between the silicon oxide film and the metal containing portion.

Photoelectric conversion apparatus, equipment including photoelectric conversion apparatus, and manufacturing method of photoelectric conversion apparatus

Photoelectric conversion apparatus including silicon oxide film and silicon nitride layers, equipment including photoelectric conversion apparatus, and manufacturing method of photoelectric conversion apparatus

A method for forming a color filter array includes a step of exposing a photosensitive color filter film, a step of forming a color filter array from the color filter film by developing the color filter film using a developer, and a step of cleaning the color filter array while rotating the color filter array and moving a nozzle for spraying fluid containing liquid and gas above the color filter array in a direction intersecting with an axis of the rotation. The method reduces variation in thickness of a color filter that is generated in the cleaning step.

Method for forming color filter array, method for manufacturing imaging apparatus, and imaging apparatus

A photomask for an optical element array includes first and second optical elements. A light transmission rate distribution includes a first area where the first optical element is to be formed, a second area where the second optical element is to be formed, and a third area between the first and second areas, has a first light transmission rate at an end portion of the first area. A second light transmission rate is higher than the first light transmission rate at another end portion. A third light transmission rate at an end portion corresponds to a boundary between the second and third areas. A fourth light transmission rate is higher than the third light transmission rate at another end portion of the second area. The light transmission rate distribution along a first direction is higher than a segment connecting the second and third light transmission rates in the third area.

Photomask, method of manufacturing optical element array, optical element array

A semiconductor device that quickly saves data stored in an area to which power is supplied intermittently. Power is supplied intermittently to a first area. Power is supplied continuously to a second area. A memory is located in the second area. A save circuit saves data used in the first area in the memory before the supply of power being stopped. A restoration circuit restores data which has been saved in the memory to a predetermined circuit in the first area. A power supply control circuit supplies power to the memory if data has been saved in the memory. Otherwise the power supply control circuit stops the supply of power to the memory.

Memory device including backup memory for saving data in standby mode

Growing community of inventors

Kawasaki, Japan

Jun Iwata