International Business Machines Corporation

Johannes M Stork

David Louis Harame

Bernard S Meyerson

Gary L Patton

Emmanuel F Crabbe

Sophie Verdonckt-Vandebroek

Subramanian Srikanteswara Iyer

Ernest Bassous

Emmanuel Crabbe'

A MISFET having a graded semiconductor alloy channel layer of silicon germanium in which the germanium is graded to a single peak percentage level. The single peak percentage level defines the location of the charge carriers within the layer. The transconductance of the device can be optimized by controlling the location of the carriers within the channel.

Method of making graded channel effect transistor

Graded channel field effect transistor

A heterojunction bipolar transistor having a single-crystal emitter with reduced charge storage and acceptable current gain is described herein. The heterojunction transistor comprises a collector region, a base region formed on the collector region, and a single-crystal emitter region grown on the base region by low temperature epitaxy. During the formation of the base region, a graded profile of 5-23% germanium is added to the base, as the distance to the collector region decreases, thereby decreasing the base bandgap as it approaches the collector region. Further, during the formation of the emitter region, a graded profile of 0-20% germanium is added to the emitter as the distance from the emitter-base junction increases. Thus, the emitter bandgap decreases as it moves farther from the emitter-base junction. The result of the above grading profiles is that the emitter bandgap is narrower at the emitter contact than the base bandgap at the emitter-base junction.

Graded bandgap single-crystal emitter heterojunction bipolar transistor

The present invention is directed to a method for forming a self-aligned epitaxial base transistor in a double polysilicon type process using non-selective low temperature epitaxy (LTE) to form the base layer. The present invention utilizes a thin very heavily doped LTE layer that is both a conductive etch stop and a diffusion source for doping the extrinsic base of the transistor. The deposition of the non-selective LTE base layer is followed immediately by the deposition of the conductive etch stop layer. A layer of undoped polycrystalline semiconductor is deposited on the conductive etch stop layer and subsequently ion implanted. Oxide and nitride insulating layers are deposited and the structure is patterned using a highly directional reactive ion etch to form the emitter window leaving a thin layer of the polycrystalline layer. The thin polycrystalline layer is selectively removed in a KOH solution leaving the conductive etch stop layer. The portion of the etch stop layer exposed in the emitter window is selectively removed by oxidation. Thereafter, conventional double polysilicon processing techniques are continued to form the insulator sidewalls and the emitter region in the window. During an annealing drive-in step, the conductive etch stop layer acts as an additional dopant source to the extrinsic base. The etch stop layer provides a conductive contact between the instrinsic base and the extrinsic base of the transistor.

Method for fabricating self-aligned epitaxial base transistor

A P- semiconductor material substrate which has been ion-implanted with N-type dopants to form an N+ subcollector layer is annealed in Argon to further remove implant damage and drive the dopant ions deeper into the P substrate. Next a lightly doped N- epitaxial layer is grown on the N+ subcollector layer. This forms the blanket collector. A P- well region is formed by growing a pad oxide of 10 nm on the N-epi layer and a 200 nm layer of nitride is then deposited on top of the layer oxide. A photoresist etch mask is used to pattern the P- well region. A reactive ion etch is performed through the dielectric oxide and nitride layers, through the epitaxial layer and stopping in the subcollector layer. A layer of low temperature expitaxial material is grown over the structure using ultra-high vacuum/chemical vapor depositions such that the epitaxial layer extends above the surface of the epitaxial layer and includes a P+ heavily doped layer and a lightly P-doped surface layer. The heavily doped P+ layer provides the low resistance contact to the collector region and the lightly doped P-layer is the collector region and its thickness is determined by the diffusion of the heavily doped layer during the entire process.

Semiconductor device with self-aligned contact to buried subcollector

A method of forming a bipolar transistor is provided, comprising the steps of: providing a semiconductor substrate including a first region of a first conductivity type; forming a layer of insulative material over a surface of the first region; forming a layer of conductive material over the layer of insulative material; patterning the first and second layers to form a generally vertical sidewall bounding an exposed portion of the first region surface; and epitaxially depositing a base region of a second conductivity type over the exposed portion of the first region surface and the sidewall such that the base region is in electrical contact with the second region.

Bipolar transistor with ultra-thin epitaxial base and method of

Method of fabricating a bipolar transistor with ultra-thin epitaxial base

A complementary bipolar transistor structure having one symmetrical intrinsic region for both the NPN and PNP transistors and a method for fabricating the structure. The transistor structure includes a vertical NPN transistor operating in the upward direction and a vertical PNP transistor operating in a downward direction. In the method, the sub-emitter and the sub-collector regions are formed by depositing a first epitaxial layer of semiconductor material of a first conductivity type on the surface of a semiconductor substrate of a second conductivity type, and forming the sub-collector by etching a shallow trench in the first layer and depositing semiconductor material of a second conductivity type by LTE and planarizing. The intrinsic regions for both of the transistors are formed by depositing a second layer of semiconductor material of the second conductivity type on the surface of the first layer and a third layer of semiconductor material of the first conductivity type on the surface of the second layer by either LTE or MBE. In one embodiment, the second and third layers are provided with a uniform vertical doping profile for one thickness of the layer and a graded doping profile for the remaining thickness in which the minimum doping level for both graded portions is at the junction between the second and third layers. The second layer forms the base and the third layer forms the collector for one transistor while at the same time the second layer forms a collector and the third layer forms the base for the other transistor. The performance of the intrinsic base and collector regions can be further improved by forming the second and third layers with a compound semiconductor material, such as, the compound of Si-Ge to create a heterojunction transistor. Device and intrinsic region isolation is effected by a combination of deep trench and shallow trench processes and reach-through regions for the sub-emitter and sub-collector are formed. A layer of polysilicon is deposited and selectively etched to form an extrinsic collector region for one transistor and extrinsic base regions for the other transistor. A further layer of single crystal silicon is deposited to form the extrinsic base region for one transistor and the emitter for the other transistor.

Complementary transistor structure and method for manufacture

A process for fabricating a bipolar transistor structure having device and isolation regions fully self-aligned. The transistor is fabricated using a process wherein collector base and emitter layers are sequentially formed on a semiconductor substrate by a molecular beam epitaxy technique. The emitter layer is covered by insulation layers and a photoresist layer is then formed on the insulation layer. The photoresist layer is masked, exposed and developed to provide a pattern which is used as an etch mask to form both the device emitter area and isolation areas. The isolation areas, the emitter region and the base and collector regions are therefore formed.

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Yorktown Heights, NY, United States of America

Johannes M Stork