Asml Netherlands B.v.

Johan Frederik Cornelis Van Gurp

Arjen Benjamin Storm

Aaron Yang-Fay Ayal

Marco Jan-Jaco Wieland

Marc Smits

Christiaan Otten

Johannes Cornelis Jacobus De Langen

Stijn Wilem Herman Karel Steenbrink

Michiel Matthieu Bruinink

Henri Kristian Ervasti

Laura Dinu Gurtler

Christiaan Ruben Van Den Berg

Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.

Stack alignment techniques

Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

Tool for testing an electron-optical assembly

Growing community of inventors

Berkel en Rodenrijs, Netherlands

Johan Frederik Cornelis Van Gurp