United Semiconductor Corp.

Jiunn-Hsien Lin

Wen-Pin Kuo

An improved method of forming a conductive line on a semiconductor substrate is described. A conductive layer is formed on the substrate. A patterned photoresist layer is formed on the conductive layer. A first etching step is performed on the conductive layer to define the conductive layer and to form a conductive line. A second etching step is performed on the conductive line to undercut the conductive line so as to make the conductive line have smaller bottom and to increase a distance between neighboring conductive lines. A third etching step is performed to remove residue generated on the substrate during the first and the second etching steps. A dielectric layer is formed to cover the conductive line. A planarization process is performed.

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Yungkang, Taiwan

Jiunn-Hsien Lin