Taiwan Semiconductor Manufacturing Comp. Ltd.

Industrial Technology Research Institute

National Yang Ming Chiao Tung University

Jing-Ye Juang

Hsien-Wei Chen

Shin-Puu Jeng

Chih Hung Chen

Su-Tsai Lu

Kai-Cheng Shie

Ming-Chih Yew

Chia-Kuei Hsu

Yu-Min Lin

A package assembly includes a package substrate including a molding material layer and a plurality of substrate portions embedded in the molding material layer, a redistribution layer (RDL) structure on the package substrate, and a plurality of semiconductor devices on the RDL structure.

Reconstructed substrates for high I/O counts application and methods for forming the same

A method of forming a semiconductor structure includes the following operations. First deep vias are formed in a first glass layer. A first redistribution layer structure is formed on a first side of the first glass layer, and the first redistribution layer structure is electrically connected to the first deep vias. A carrier is bonded to the first redistribution layer structure. The first glass layer is grinded until surfaces of the first deep vias are exposed. A second redistribution layer structure is formed on a second side of the first glass layer opposite to the first side, and the second redistribution layer structure is electrically connected to the first deep vias.

Semiconductor structures including glass core layer and methods of forming the same

A semiconductor structure includes an assembly including an interposer, at least one semiconductor die attached to the interposer including interposer bonding pads, and a die-side underfill material portion located between the interposer and the at least one semiconductor die, a packaging substrate including substrate bonding pads, an array of solder material portions bonded to the interposer bonding pads and the substrate bonding pads, a central underfill material portion laterally surrounding a first subset of the solder material portions, and at least one peripheral underfill material portion contacting corner regions of the interposer and a respective surface segment of the central underfill material portion and having a different material composition than the central underfill material portion.

Dual-underfill encapsulation for packaging and methods of forming the same

Disclosed herein is an electrical connecting structure having nano-twins copper, including a first substrate having a first nano-twins copper layer and a second substrate having a second nano-twins copper layer. The first nano-twins copper layer includes a plurality of first nano-twins copper grains. The second nano-twins copper layer includes a plurality of second nano-twins copper grains. The first nano-twins copper layer is joined with the second nano-twins copper layer. At least a portion of the first nano-twins copper grains extend into the second nano-twins copper layer, or at least a portion of the second nano-twins copper grains extend into the first nano-twins copper layer.

Electrical connecting structure having nano-twins copper

Disclosed herein is a method of forming an electrical connecting structure having nano-twins copper. The method includes the steps of (i) forming a first nano-twins copper layer including a plurality of nano-twins copper grains; (ii) forming a second nano-twins copper layer including a plurality of nano-twins copper grains; and (iii) joining a surface of the first nano-twins copper layer with a surface of the second nano-twins copper layer, such that at least a portion of the first nano-twins copper grains grow into the second nano-twins copper layer, or at least a portion of the second nano-twins copper grains grow into the first nano-twins copper layer. An electrical connecting structure having nano-twins copper is provided as well.

Electrical connecting structure having nano-twins copper and method of forming the same

A chip stack structure taking a wafer as a stacking base and stacking chips thereon is provided. The chip stack structure is capable of achieving high density electrode bonding and breaking the bottleneck of requiring interposer to serve as a transferring interface in three dimensional chip package. The chip stack structure is easily fabricated and compatible with wafer level process, so as to reduce processing time and manufacturing cost. A method for fabricating the chip stack structure is also provided.

Chip stack structure and method for fabricating the same

A wafer level molding structure including a first chip, a second chip and an adhesive layer therebetween is provided. The first chip includes a first back side, a first front side and a plurality of lateral sides, and a plurality of first front side bumps are disposed on the first front side. The second chip includes a second back side and a second front side, and a plurality of second back side bumps and second front side bumps are respectively disposed on the second back side and the second front side. A plurality of through electrodes are disposed in the second chip, and electrically connected the second back side bumps to the second front side bumps. Adhesive materials including a plurality of conductive particles cover the lateral sides, and electrically connect the second back side bumps with the first front side bumps.

Growing community of inventors

Hsinchu, Taiwan

Jing-Ye Juang