Tsmc-acer Semiconductor Manufacturing Corporation

Jia-ren Chen

Shiou-han Liaw

Calvin Wu

Yau-feng Lo

Yen-hung Lai

Po-lung Chuang

A method for fabricating poly-spacers used in a semiconductor substrate, comprising: forming an undoped first polysilicon layer on the semiconductor substrate; performing a first ion implantation with a first angle to implant impurities into the first polysilicon layer; performing a second ion implantation with a second angle to implant the impurities into the first polysilicon layer; forming a second polysilicon layer on the first polysilicon layer; and etching the first polysilicon layer and the second polysilicon layer to form spacers.

Growing community of inventors

Hsin Chu, Taiwan

Jia-ren Chen