Taiwan Semiconductor Manufacturing Comp. Ltd.

Jen-Cheng Liu

Dun-Nian Yaung

Min-Feng Kao

Feng-Chi Hung

Jeng-Shyan Lin

Wen-De Wang

Szu-Ying Chen

Chun-Chieh Chuang

Hsing-Chih Lin

Tzu-Hsuan Hsu

Shuang-Ji Tsai

Shu-Ting Tsai

Pao-Tung Chen

Tzu-Jui Wang

Keng-Yu Chou

Hsiao-Hui Tseng

Ching-Chun Wang

Wei Chuang Wu

Yi-Shin Chu

Yen-Ting Chiang

Hsun-Ying Huang

Wen-I Hsu

Chun-Yuan Chen

Jhy-Jyi Sze

U-Ting Chen

Meng-Hsun Wan

Wei-Cheng Hsu

Shyh-Fann Ting

Shih Pei Chou

Chia-Shiung Tsai

Kuan-Chieh Huang

Cheng-Ying Ho

Shih-Han Huang

Chao-Cheng Chen

Yimin Huang

Alexander Kalnitsky

Shou-Gwo Wuu

Chun-Hao Chuang

Wei-Chieh Chiang

Kazuaki Hashimoto

Yin-Kai Liao

Yen-Yu Chen

Chen-Jong Wang

Ping-Yin Liu

Sheng-Chau Chen

Volume Chien

Lan-Lin Chao

Sheng-Chan Li

Feng-Jia Shiu

Kong-Beng Thei

Yu-Jen Wang

Cheng-Chieh Hsieh

Hsin-Hung Chen

Fu-Jier Fan

Hsiao-Chin Tuan

Wen-Chang Kuo

Jung-Kuo Tu

Yi-Sheng Chen

Seiji Takahashi

Han-Chi Liu

Yeur-Luen Tu

Yuichiro Yamashita

Chun-Wei Chang

Kuo-Ming Wu

Bruce C S Chou

Chih-Hui Huang

Yung-Lung Lin

Yuan-Hung Liu

Li-Chih Chao

Hsiang-Lin Chen

Jyu-Horng Shieh

Po-Chun Liu

Hsin-Hui Lee

Shih-Pei Chou

Ming-Tsong Wang

Huan-Just Lin

Chen-Cheng Kuo

Chien-Hsien Tseng

Calvin Yi-Ping Chao

Ching-Chung Su

Chen-Shien Chen

Cheng-Yuan Tsai

Kuo-Cheng Lee

Chung-Yi Yu

Hun-Jan Tao

Chun-Hao Chou

Cheng-Ta Wu

Chia-Hao Hsu

Xiaomeng Chen

Xin-Hua Huang

Hung-Chang Hsieh

Hung-Ling Shih

Yi-Nien Su

Hung-Hua Lin

Chia-Wei Liu

Chung-Chuan Tseng

Tse-Hua Lu

Ching-Hung Cheng

Chih-Chien Wang

Shih Kuang Yang

A semiconductor device includes a first semiconductor chip including a first substrate, a plurality of first dielectric layers and a plurality of conductive lines formed in the first dielectric layers over the first substrate. The semiconductor device further includes a second semiconductor chip having a surface bonded to a first surface of the first semiconductor chip, the second semiconductor chip including a second substrate, a plurality of second dielectric layers and a plurality of second conductive lines formed in the second dielectric layers over the second substrate. The semiconductor device further includes a first conductive feature extending from the first semiconductor chip to one of the plurality of second conductive lines, and a first seal ring structure extending from the first semiconductor chip to the second semiconductor chip.

3DIC seal ring structure and methods of forming same

Semiconductor devices and methods of manufacture thereof are disclosed. In some embodiments, a semiconductor device includes a first semiconductor chip including a first substrate and a first conductive feature formed over the first substrate, and a second semiconductor chip bonded to the first semiconductor chip. The second semiconductor chip includes a second substrate and a second conductive feature formed over the second substrate. A conductive plug is disposed through the first conductive feature and is coupled to the second conductive feature. The conductive plug includes a first portion disposed over the first conductive feature, the first portion having a first width, and a second portion disposed beneath or within the first conductive feature. The second portion has a second width. The first width is greater than the second width.

Semiconductor devices and methods of manufacture thereof

The present disclosure, in some embodiments, relates to a method of forming an integrated chip structure. The method includes forming a first dielectric bonding layer over a first dielectric structure, which is disposed on a first substrate and surrounds a first plurality of interconnects. The first dielectric bonding layer is patterned to form a first recess exposing one of the first plurality of interconnects. A first conductive bonding segment is formed within the first recess. A second dielectric bonding layer is formed over a TSV extending through a second substrate. The second dielectric bonding layer is patterned to form a second recess exposing the TSV. A second conductive bonding segment is formed within the second recess. The first substrate is bonded to the second substrate along an interface comprising dielectric and conductive regions. The conductive region includes a conductive interface between the first and second conductive bonding segments.

Stacked substrate structure with inter-tier interconnection

The present disclosure relates to an integrated chip. The integrated chip includes a substrate having a first semiconductor material. A second semiconductor material is disposed on the first semiconductor material and a passivation layer is disposed on the second semiconductor material. A first doped region and a second doped region extend through the passivation layer and into the second semiconductor material. A silicide is arranged within the passivation layer and along tops of the first doped region and the second doped region.

Passivation layer for epitaxial semiconductor process

Various embodiments of the present disclosure are directed towards an integrated chip (IC). The IC includes a first inter-metal dielectric (IMD) structure disposed over a semiconductor substrate. A metal-insulator-metal (MIM) device is disposed over the first IMD structure. The MIM device includes at least three metal plates that are spaced from one another. The MIM device further includes a plurality of capacitor insulator structures. Each of the plurality of capacitor insulator structures are disposed between and electrically isolate neighboring metal plates of the at least three metal plates.

Metal-insulator-metal device with improved performance

A three-dimensional (3D) integrated circuit (IC) is provided. In some embodiments, the 3D IC comprises a first IC die comprising a first substrate, a first interconnect structure disposed over the first substrate, and a first through substrate via (TSV) disposed through the first substrate. The 3D IC further comprises a second IC die comprising a second substrate, a second interconnect structure disposed over the second substrate, and a second TSV disposed through the second substrate. The 3D IC further comprises a bonding structure arranged between back sides of the first IC die and the second IC die opposite to corresponding interconnect structures and bonding the first IC die and the second IC die. The bonding structure comprises conductive features disposed between and electrically connecting the first TSV and the second TSV.

Hybrid bonding technology for stacking integrated circuits

Various embodiments of the present disclosure are directed towards an image sensor including a plurality of photodetectors disposed within a substrate. The substrate comprises a front-side surface opposite a back-side surface. An outer isolation structure is disposed in the substrate and laterally surrounds the plurality of photodetectors. The outer isolation structure has a first height. An inner isolation structure is spaced between sidewalls of the outer isolation structure. The inner isolation structure is disposed between adjacent photodetectors in the plurality of photodetectors. The outer isolation structure and the inner isolation structure respectively extend from the back-side surface toward the front-side surface. The inner isolation structure comprises a second height less than the first height.

Isolation structure to increase image sensor performance

A semiconductor structure and a manufacturing method thereof are provided. A semiconductor structure includes top, bottom, and middle tiers. The bottom tier includes a first interconnect structure overlying a first semiconductor substrate, and a first front-side bonding structure overlying the first interconnect structure. The middle tier interposed between and electrically coupled to the top and bottom tiers includes a second interconnect structure overlying a second semiconductor substrate, a second front-side bonding structure interposed between the top tier and the second interconnect structure, and a back-side bonding structure interposed between the second semiconductor substrate and the first front-side bonding structure. A bonding feature of the second front-side bonding structure includes a first bonding via in contact with the second interconnect structure, a first bonding contact overlying the first bonding via, and a barrier layer interface between a bottom of the first bonding contact and a top of the first bonding via.

Semiconductor structure and manufacturing method thereof

A semiconductor device includes a substrate having a front side and a back side opposite to each other. A plurality of photodetectors is disposed in the substrate within a pixel region. An isolation structure is disposed within the pixel region and between the photodetectors. The isolation structure includes a back side isolation structure extending from the back side of the substrate to a position in the substrate. A conductive plug structure is disposed in the substrate within a periphery region. A conductive cap is disposed on the back side of the substrate and extends from the pixel region to the periphery region and electrically connects the back side isolation structure to the conductive plug structure. A conductive contact lands on the conductive plug structure, and is electrically connected to the back side isolation structure through the conductive plug structure and the conductive cap.

Semiconductor device including image sensor and method of forming the same

Some embodiments are directed towards an image sensor device. A photodetector is disposed in a semiconductor substrate, and a transfer transistor is disposed over photodetector. The transfer transistor includes a transfer gate having a lateral portion extending over a frontside of the semiconductor substrate and a vertical portion extending to a first depth below the frontside of the semiconductor substrate. A gate dielectric separates the lateral portion and the vertical portion from the semiconductor substrate. A backside trench isolation structure extends from a backside of the semiconductor substrate to a second depth below the frontside of the semiconductor substrate. The backside trench isolation structure laterally surrounds the photodetector, and the second depth is less than the first depth such that a lowermost portion of the vertical portion of the transfer transistor has a vertical overlap with an uppermost portion of the backside trench isolation structure.

Image sensor with overlap of backside trench isolation structure and vertical transfer gate

Various embodiments of the present application are directed towards an integrated circuit (IC) in which a shield structure blocks the migration of charge to a semiconductor device from proximate a through substrate via (TSV). In some embodiments, the IC comprises a substrate, an interconnect structure, the semiconductor device, the TSV, and the shield structure. The interconnect structure is on a frontside of the substrate and comprises a wire. The semiconductor device is on the frontside of the substrate, between the substrate and the interconnect structure. The TSV extends completely through the substrate, from a backside of the substrate to the wire, and comprises metal. The shield structure comprises a PN junction extending completely through the substrate and directly between the semiconductor device and the TSV.

Shield structure for backside through substrate vias (TSVs)

Various embodiments of the present disclosure are directed towards an integrated circuit (IC) chip in which a bond pad structure extends to a columnar structure with a high via density. For example, an interconnect structure is on a frontside of a substrate and comprises a first bond wire, a second bond wire, and bond vias forming the columnar structure. The bond vias extend from the first bond wire to the second bond wire. The bond pad structure is inset into a backside of the substrate, opposite the frontside, and extends to the first bond wire. A projection of the first or second bond wire onto a plane parallel to a top surface of the substrate has a first area, and a projection of the bond vias onto the plane has a second area that is 10% or more of the first area, such that via density is high.

Bond pad structure with high via density

In some embodiments, the present disclosure relates to a 3D integrated circuit (IC) stack that includes a first IC die bonded to a second IC die. The first IC die includes a first semiconductor substrate, a first interconnect structure arranged on a frontside of the first semiconductor substrate, and a first bonding structure arranged over the first interconnect structure. The second IC die includes a second semiconductor substrate, a second interconnect structure arranged on a frontside of the second semiconductor substrate, and a second bonding structure arranged on a backside of the second semiconductor substrate. The first bonding structure faces the second bonding structure. Further, the 3D IC stack includes a first backside contact that extends from the second bonding structure to the backside of the second semiconductor substrate and is thermally coupled to at least one of the first or second interconnect structures.

Backside contact to improve thermal dissipation away from semiconductor devices

A metal grid within a trench isolation structure on the back side of an image sensor is coupled to a contact pad so that a voltage on the metal grid is continuously variable with a voltage on the contact pad. One or more conductive structures directly couple the metal grid to a contact pad. The conductive structures may bypass a front side of the image sensor. A bias voltage on the metal grid may be varied through the contact pad whereby a trade-off between reducing cross-talk and increasing quantum efficiency may be adjusted dynamically in accordance with the application of the image sensor, its environment of use, or its mode of operation.

CSI with controllable isolation structure and methods of manufacturing and using the same

An image sensor includes a substrate including a first surface and a second surface opposite to the first surface; a plurality of pixel sensors disposed in the substrate, a sensor isolation feature disposed in the substrate defining an active region, and a dielectric layer between the sensor isolation feature and the substrate, wherein the sensor isolation feature comprises a conductive material.

Semiconductor image sensor and method of manufacturing the same

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Hsin-Chu, Taiwan

Jen-Cheng Liu