Commissariat a L'energie Atomique

Etat Francais

Jean-Yves Robic

Bernard Aspar

Jean Dijon

Christelle Charpin-Nicolle

Etienne Quesnel

Jean Marty

Philippe Nerin

Bernard Rolland

The invention relates to a reflection lithography mask comprising, on a substrate (S), a reflector coating (RC) and a stack comprised of an etching barrier layer and an absorbing layer, said stack covering only a part of the reflector coating. The absorbing layer is made solely of dielectric material and constitutes the surface layer of the mask. Advantageously, this dielectric material is HfO. Said material makes it possible to reduce the thickness of the mask pattern and as a result to decrease the shadow region (Z) during mask exposure. The invention applies to reflection lithography.

Structure of a lithography mask

The invention concerns a structure for a lithographic reflection mask comprising a receive medium ( ) on which is fixed a reflector ( ) including at least one layer, the reflector ( ) being fixed to the receive medium ( ) in a reverse manner relative to a manufacturing medium ( ) on which it has previously been manufactured and which is then

Structure for a reflection lithography mask and method for making same

A microlaser cavity is provided with a solid active medium (2), an entry mirror (4), an exit mirror (60) and a layer of electrically resistive material formed on one of the surfaces of the microcavity. The electrically resistive layer has optical transparency and reflectivity properties adapted to the surface of the microcavity on which the layer is deposited.

Microlaser with modulated emission frequency

The invention relates to a multilayer stack of fluoride materials usable in optics and its production process. This stack is constituted by alternating layers of a first, high index, fluoride material such as YF.sub.3 and a second, low index fluoride material such as LiF, able to form together a specific, stable compound such as YLiF.sub.4, so that the interface between two adjacent layers of the stack is at least partly formed from said compound.

Growing community of inventors

Grenoble, France

Jean-Yves Robic