Steag Rtp Systems Gmbh

Mattson Thermal Products Gmbh

J&uuml;rgen Niess

Wilfried Lerch

Zsolt Nenyei

Thomas Graf

A method of removing first molecules adsorbed on the surfaces of a chamber and/or at least one object found in the chamber is provided. Second, polar molecules that have a desorptive effect on the first molecules are introduced into the chamber. The second molecules comprise nitrogen and hydrogen, and especially NH molecules.

Method for the removing of adsorbed molecules from a chamber

The invention relates to a method for generating defect profiles in a crystal or crystalline structure of a substrate, preferably a semiconductor, during a thermal treatment in a process chamber. According to the inventive method, a concentration and/or a density distribution of defects is controlled with at least one reactive component each depending on at least two process gases that differ in their composition. At least two of the process gases independently act upon at least two different surfaces of the substrate.

Growing community of inventors

Sontheim, Germany

Jürgen Niess

Growing community of inventors

Sontheim, Germany

J&uuml;rgen Niess

Jürgen Niess