Fei Comapny

Other

James B McGinn

Gregory A Schwind

Mark Utlaut

Sean Kellogg

Gerald G Magera

David S Jun

N William Parker

Mostafa Maazouz

Andrew B Wells

Anthony Graupera

Robert L Gerlach

David William Tuggle

Charles Otis

Trevor Dingle

Sander G Den Hartog

Miriam Spagnol

Mark W Utlaut

Detectors, systems, and methods for detecting lateral beam displacement for a beam microscopy system are described herein. In one aspect, a detector can include an aperture for allowing a charged particle beam passing through the detector and irradiating a sample; and a plurality of rails arranged in a first plane extending radially outward from the aperture, wherein each of the plurality of rails is configured to detect charged particles from the charged particle beam before irradiating the sample.

Systems and methods for detecting beam displacement

Variations in charged-particle-beam (CPB) source location are determined by scanning an alignment aperture that is fixed with respect to a beam defining aperture in a CPB, particularly at edges of a defocused CPB illumination disk. The alignment aperture is operable to transmit a CPB portion to a secondary emission surface that produces secondary emission directed to a scintillator element. Scintillation light produced in response is directed out of a vacuum enclosure associated with the CPB via a light guide to an external photodetection system.

Methods for determining the virtual source location of a liquid metal ion source

Disclosed herein are apparatuses and systems for reentrant fluid delivery techniques. An example system includes at least a fluid delivery conduit extending between first and second electrical potentials, wherein the fluid delivery conduit is formed into a tilted helical so that a fluid flowing through the fluid delivery conduit experiences an electric field reversal through each winding of the fluid delivery conduit.

Reentrant gas system for charged particle microscope

An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.

High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped

An ExB Wien mass filter providing a method and structure for mechanically adjusting the magnetic field distributions at the mass filter entrance and exit end caps. The reluctance of the flux return path may be modified by configuring pluralities of magnetic shims within slots at the outer diameters of the entrance and exit end caps, and also by configuring pluralities of magnetic plug shims within circular flux dams surrounding the entrance and exit apertures. Advantages of purely mechanical adjustment for the magnetic fields of the present invention, compared with prior art electromagnet adjustment methods include greater reliability, simplicity, lower cost, and lack of power dissipation. The invention may employ either permanent magnets or electromagnets for generation of the mass-separation magnetic field.

Method and structure for controlling magnetic field distributions in an ExB Wien filter

A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer.

Retarding field analyzer integral with particle beam column

An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.

Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation

A secondary particle detectorfor a charged particle beam systemincludes a scintillatorand a transducer, such as a photomultiplier tube, positioned within a vacuum chamber. Unlike prior art Everhart-Thornley detectors, the photomultiplier is positioned within the vacuum chamber, which improves detection by eliminating optical couplings and provides flexibility in positioning the detector.

In-chamber electron detector

A low input power consumption, compact thermal field emitter is suitable for use in electron beam systems, particularly those systems that use an array of electron beams or a miniature electron beam system. The thermal field emitter design reduces heat loss by reducing heat transfer to the base. To achieve reduced loses the design incorporates the use of high electrical resistivity, low thermal conductivity materials for construction of the filament posts and the filaments. Such materials further reduce heat loss and reduce input current requirements. In one embodiment, the base includes counterbores that reduce the heat conduction path between the filament posts and the base, and moves the contact area further from the filament.

Low power schottky emitter

The invention adds one or more surface contour(s) to the bombarded area(s) within ion columns to greatly reduce the likelihood that back sputtered material will reach the ion generating source. A number of different surface contours are disclosed including angled surfaces, surfaces defining cups to capture back sputtered material, pre-textured and forested surfaces. The different surfaces can be used in any combination. The reduction in back sputtered material reaching the ion source reduces the time to stability, greatly increases the working stability, and increases the lifespan of the source.

Shaped sputter shields for improved ion column operation

A electron emission cathode includes an emitter having an apex from which electrons are emitted. The emitter is attached to a heating filament at a junction and extends from the junction both forward toward the apex and rearward. A reservoir of material that lowers the work function of the emitter is positioned on the rearward extending portion of the emitter. By positioning the reservoir on the rearward extending portion, the reservoir can be positioned sufficiently far from the junction to reduce its temperature and thereby greatly increase the useful life, of the emitter without adversely affected the emission characteristics of the source.

Schottky emitter having extended life

An ion pump anode eliminates the intercellular spaces while maintaining an efficient cell shape in which the plasma sheath follows the contour of the cell wall. The cell are preferably quasi-cylindrical and can be manufactured by folding one or more metal strip into a corrugation and welding the strip to create separate cells. By eliminating the intercellular region, which support a high plasma density, the formation of dendrites under such a region is prevented and instabilities caused by those dendrites are eliminated.

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Portland, OR, United States of America

James B McGinn