Samsung Electronics Co., Ltd.

Sungkyunkwan University

Jaewhan Sung

Jihoon Na

Hyunjune Cho

Sungho Kang

Mun Ja Kim

Byungchul Yoo

Jibeom Yoo

Hakseok Lee

Myeongjin Jeong

Hak-Seok Lee

An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

Apparatus for generating extreme ultraviolet (EUV), method of manufacturing the same, and EUV system

An EUV mask inspection system includes a mask receiving unit configured to receive a manufactured EUV mask, a main chamber configured to perform an inspection on the EUV mask, and a load-lock chamber disposed between the mask receiving unit and the main chamber. The load-lock chamber includes a mask table for loading the EUV mask, an UV lamp disposed adjacent the mask table in a first direction, a cold trap disposed adjacent the mask table in a second direction, and a vacuum pump. The first direction is a direction perpendicular to a sidewall of the mask table, and the second direction is a direction perpendicular to a top surface of the mask table. The UV lamp is configured to evaporate water molecules on the EUV mask by irradiating UV light onto the EUV mask. The cold trap is configured to trap the water molecules evaporated from the EUV mask.

Extreme ultraviolet (EUV) mask inspection system, a load-lock chamber included therein, and a method for inspecting an EUV mask using the EUV mask inspection system

Growing community of inventors

Suwon-si, South Korea

Jaewhan Sung