Carl-Zeiss-Smt Ag

Carl Zeiss Smt Gmbh

Jürgen Hartmaier

Damian Fiolka

Manfred Maul

Jens Kugler

Hubert Holderer

Christian Wagner

Alexander Kohl

Winfried M Kaiser

Gundula Weiss

Martin Brunotte

Frank Marianek

Detlev Müller

A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

Projection lens and microlithographic projection exposure apparatus

Growing community of inventors

Oberkochen, Germany

Jürgen Hartmaier