Asml Holding N.v.

Asml Netherlands B.v.

Iliya Sigal

Matthew Lipson

Tammo Uitterdijk

Michael Perry

Mehmet Ali Akbas

David Hart Peterson

Satish Achanta

Richard Bryan Lewis

David Heald

Benjamin David Dawson

Matthew Anthony Sorna

A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

Lithographic apparatus, substrate table, and method

Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.

Lithography supports with defined burltop topography

Various burl designs for holding an object in a lithographic apparatus are described. A lithographic apparatus includes an illumination system, a first support structure, a second support structure, and a projection system. The illumination system is designed to receive radiation and to direct the radiation towards a patterning device that forms patterned radiation. The first support structure is designed to support the patterning device on the first support structure. The second support structure has a plurality of burls and is designed to support the substrate on the plurality of burls. A topography of a top surface of each of the plurality of burls is not substantially flat, such that a contact area between the substrate and each of the plurality of burls is reduced. The projection system is designed to receive the patterned radiation and to direct the patterned radiation towards the substrate.

Burls with altered surface topography for holding an object in lithography applications

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Stamford, CT, United States of America

Iliya Sigal