Carl Zeiss Sms Ltd.

Igor Varvaruk

Vladimir Dmitriev

Guy Ben-Zvi

Ofir Sharoni

Erez Graitzer

Eran Chason

A method includes generating, using a data processor, information showing variations of a parameter across a photo mask relative to an average value of the parameter measured at various locations on the photo mask. For example, the information can include data points, and each data point can be determined based on a ratio between a measurement value and an average of a plurality of measurement values.

Analyses of measurement data

A contribution to a wafer level critical dimension distribution from a scanner of a lithography system can be determined based on measured wafer level critical dimension uniformity distribution and a contribution to the wafer level critical dimension distribution from a photo mask. Light transmission () across the photo mask () can be measured, a transmittance variation distribution of the photo mask can be determined, and the contribution to the wafer level critical dimension distribution from the photo mask () can be determined () based on the transmittance variation distribution of the photo mask.

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Migdal Haemek, Israel

Igor Varvaruk