Mitsubishi Materials Corporation

Ichiro Shiono

Shozo Komiyama

Yuto Toshimori

Yoshinori Sawada

An &#x3b1;-ray measuring device which is provided with: a box-shaped chamber that has a gas inlet and a gas outlet; a cathode film which is provided within the box-shaped chamber; a plurality of anode wires which are arranged parallel to each other at a distance from the cathode film, while being electrically connected to each other and having a diameter of from 1 &#x3bc;m to 30 &#x3bc;m (inclusive); and a plurality of cathode wires which are arranged parallel to each other at a distance from the anode wires, while being electrically connected to the cathode film and having a diameter of from 1 &#x3bc;m to 30 &#x3bc;m (inclusive).

&#x3b1;-ray measuring device

A sputtering target, which has a composition comprising: one or more elements selected from Cu, Sn, Sb, Mg, In, and Ti in a range of 0.1 atomic % or more and 15.0 atomic % or less in total; S in a range of 0.5 atomic ppm or more and 200 atomic ppm or less; and a Ag balance including inevitable impurities, is provided.

Growing community of inventors

Sanda, Japan

Ichiro Shiono