Samsung Electronics Co., Ltd.

Hyang-Ja Yang

Chul-Sung Park

Yong-Hwan Noh

Sung-Hoon Kim

Su-Yeon Kim

Uk-Rae Cho

Byong-Kwon Lee

Hak-soo Yu

Jung-Hyeon Kim

Seung-Min Lee

Choong-Sun Shin

Su-Jin Park

Chang-Bum Kim

Jae-Eun Lee

Young-Soo An

Jong-Hak Won

Jeong-soo Park

Kook-Hwan Kwon

Wol-Jin Lee

Ji-Suk Kwon

Jae-ick Son

Kang-Young Kim

Hwa-Jin Kim

Woo-Joung Kim

Song-Ja Lee

Yun-Jin Jo

Hong-Kyun Kim

An optical proximity correction (OPC) verifying method including checking a first location of a first pattern in a layout of a stacked memory device, calculating a shift value of the first pattern according to the first location, obtaining a difference value between the first location and a second location of a second pattern formed through an OPC with respect to the first pattern, and determining whether the OPC is to be performed again, based on the shift value and the difference value.

Stacked memory device, optical proximity correction (OPC) verifying method, method of designing layout of stacked memory device, and method of manufacturing stacked memory device

A method and system for verifying a layout of an integrated circuit (IC) is disclosed. The IC may include a plurality of strings each including a plurality of memory cells which are vertically stacked on a substrate. The method may include receiving schematic data of the IC including instances of a string symbol and layout data, preparing a layout versus schematic (LVS) rule file in which a string device is defined, and performing LVS verification.

Method and system for verifying layout of integrated circuit including vertical memory cells

A data line layout includes column selection lines arranged in a first direction at a layer on a memory cell array region, and data lines arranged in the first direction at the layer, the data lines being connected between I/O sense amplifiers and I/O pads.

Area-efficient data line layouts to suppress the degradation of electrical characteristics

A sub-word line driver includes a substrate, a plurality of gate lines and at least one gate tab. The substrate includes a plurality of isolation areas and a plurality of active areas, where the two active areas are separated by each isolation area, and the isolation areas and the active areas are extended in a first direction and are arranged in a second direction perpendicular to the first direction. The plurality of gate lines are formed on the substrate, where the gate lines are extended in a second direction and are arranged in the first direction. The at least one gate tab is formed on the substrate, where the at least one gate tab is extended in the first direction to cover the isolation area. Incorrect operation of the sub-word line driver may be prevented, and a power consumption of the sub-word line driver may be reduced.

Sub-word line driver circuit and semiconductor memory device having the same

A semiconductor device includes a diode region having a plurality of protection diodes and a pad region overlapped with an upper part of the diode region. The pad region having a pad installed corresponding to an external connection terminal. The semiconductor device further includes a contact plug unit which connects at least one of a plurality of active regions constituting the diode region and the pad within the diode region.

Semiconductor device including a metal layer having a first pattern and a second pattern which together form a web structure, thereby providing improved electrostatic discharge protection

In an embodiment, a bit line sense amplifier of a semiconductor memory device with an open bit line structure includes sense amplifier blocks, first voltage drivers, and a second voltage driver. The sense amplifier blocks include a first sense amplifier and a second sense amplifier, each sensing and amplifying a signal difference between a bit line and a complementary bit line. The first voltage drivers apply a power source voltage to the first sense amplifier, and the second voltage driver applies a ground voltage to the second sense amplifier. The first voltage drivers are disposed for every two or more sense amplifier blocks in a bit line sense amplifier region in which the sense amplifier blocks are arranged, and the second voltage driver is disposed in a conjunction region in which a control circuit is located to control the sense amplifier blocks. Both capacitive noise and device size are minimized.

Bit line sense amplifier of semiconductor memory device having open bit line structure

A semiconductor device having transistors formed on different layers of a stack structure includes a stacked capacitor cluster, wherein a stacked capacitor of the stacked capacitor cluster includes an insulation layer of a transistor of the semiconductor device, and at least a first conduction layer and a second conduction layer disposed above and below the insulation layer, wherein the stacked capacitor is a decoupling capacitor of the stacked capacitor cluster connected in parallel between a first line and a second line.

Semiconductor device having stacked decoupling capacitors

A stacked memory cell for use in a high-density static random access memory is provided that includes first and second pull-down transistors formed in a first layer, a pass transistor connected between a gate of the second pull-down transistor and a bit line and formed in the first layer and a first and second pull-up transistors formed in a second layer located above the first layer and connected with the first and second pull-down transistors respectively to form an inverter latch. With the construction of a stacked memory cell having a lone pass transistor, cell size is reduced compared to a conventional six-transistor cell, and driving performance of the pass transistor can be improved.

Stacked memory cell for use in high-density CMOS SRAM

Example embodiments relate to a semiconductor memory device, for example, a semiconductor memory device including an efficient layout circuit and method thereof. The method may include sharing a first active area between a first precharger and a second precharger and sharing a second active area between a third precharger and a fourth precharger. The semiconductor memory device may include a level shifter configured to receive a first precharge control signal and boost a logic high level of the first precharge control signal to an external power supply voltage level to output a boosted first precharge control signal. The semiconductor memory device may further include first, second, third and fourth prechargers. The first and third prechargers may be configured to precharge data signals transmitted to a first and second pair of local input/output data lines to the first precharge voltage in response to the boosted first precharge control signal during a data read operation.

Semiconductor memory device and layout method thereof

A layout structure of a Sub-Word Line Driver (SWD) and a forming method thereof. A layout structure of an SWD may include first through fourth metal-oxide-semiconductor (MOS) transistors. The layout structure may include a first area including an active area of the first MOS transistor, wherein a gate-poly (GP) of the first MOS transistor may be disposed in a predefined direction over a portion of the first area. The layout structure may also include a second area including an active area of the second through fourth MOS transistors. Each GP of the second through fourth MOS transistors may be disposed in parallel to each other. The GP of the first MOS transistor disposed in the predefined direction may be substantially perpendicular to each GP of the second through fourth MOS transistors. The layout structure of an SWD can improve a driving capability without increasing an area of the chip.

Layout structure of sub-world line driver and forming method thereof

An improved circuit wiring layout provides smooth circuit wiring in a peripheral circuit region adjacent to a memory cell region of a semiconductor memory device, and eliminates a write-speed limiting factor. Forming a metal (instead of a metal silicided polysilicon) wiring layer to be connected to a gate layer, to transmit an electrical signal to the gates of FET (e.g., MOSFET (Metal Oxide Semiconductor Field Effect Transistor) transistors formed in the peripheral circuit region; the metal wiring layer is formed (e.g., using one metal damascene process), on a layer different from a word line layer formed on the gate layer (e.g., using another metal damascene process), thereby obtaining a layout of a peripheral circuit region having a reduced area and without using a silicide process.

Circuit wiring layout in semiconductor memory device and layout method

In a layout structure of a plurality of metal oxide semiconductor (MOS) transistors, the layout structure may include a first group of MOS transistors having first drain regions and first source regions that are individually allocated to a group active region that is isolated from all sides by a trench isolation, and a second group of MOS transistors having second drain regions and second source regions allocated to the group active region. The second group is disposed between the first group and an edge of the group active region. One or both of the first drain regions and first source regions are not in contact with an edge of the trench isolation in a length direction of a finger-type gate electrode.

Layout structure of MOS transistors on an active region

An apparatus including a trolling motor having at least one operational subsystem and the trolling motor also having an integral electronic controller for controlling the operational subsystem wherein the improvement comprises an integral electronic diagnostic system which will receive diagnostic information from the operational subsystem and will transmit the diagnostic information for reception externally of the trolling motor.

Growing community of inventors

Suwon-si, South Korea

Hyang-Ja Yang