Taiwan Semiconductor Manufacturing Comp. Ltd.

Hsien-Wen Liu

Shin-Puu Jeng

Jui-Pin Hung

Shuo-Mao Chen

Feng-Cheng Hsu

Po-Yao Chuang

Hsiao-Wen Lee

Shih-Ting Hung

Jing-Cheng Lin

Cheng-Lin Huang

Yi-Jou Lin

Han-Hsiang Huang

Po-Yao Lin

Hsien-Wei Chen

Min-Chen Lin

Tzu-Jui Fang

Po-Hao Tsai

Chih-Hao Chen

Chih-Hsien Lin

Hsiang-Tai Lu

Yi-Lin Tsai

Dai-Jang Chen

Chen-Hua Douglas Yu

Jie Chen

Yi-Wen Wu

Chin-Fu Kao

Yao-Chun Chuang

Hsi-Kuei Cheng

Chin-Chuan Chang

Meng-Liang Lin

Yi-Jen Lai

Wen-Yi Lin

Chung Yu Wang

Shyue-Ter Leu

Yinlung Lu

Yi-Chao Mao

Kung-Chen Yeh

Chih-Kang Han

Long Hua Lee

Jyun-Lin Wu

Shih-Yi Syu

Chun-Hsing Su

Ying-Tz Hung

Shih-Yung Peng

Methods for improving joinder between a surface-mount package and a printed circuit board are disclosed. The warpage at a corner of the surface-mount package and at a corresponding corner of a joint area on the printed circuit board are measured to determine the degree of mismatch. A mini-pad is applied to the corner between the surface-mount package and the joint area on the printed circuit board. The thickness of the mini-pad pushes against the surface-mount package and the printed circuit board, reducing the degree of mismatch below a critical dimension of a ball grid array of the surface-mount package. The surface-mount package can then be soldered to the joint area, reducing or preventing the formation of solder bridges and short circuits.

Methods and systems for improving surface mount joinder

Multi-chip wafer level packages and methods of forming the same are provided. A multi-chip wafer level package includes a first tier and a second tier. The first tier includes a first redistribution layer structure and at least one chip over the first redistribution layer structure. The second tier includes a second redistribution layer structure and at least two other chips over the second redistribution layer structure. The first tier is bonded to the second tier with the at least one chip being in physical contact with the second redistribution layer structure. The total number of connectors of the at least two other chips is greater than the total number of connectors of the at least one chip.

Multi-chip packages and methods of forming the same

A semiconductor device includes a semiconductor die. The semiconductor die includes a device layer, an interconnect layer over the device layer, a conductive pad over the interconnect layer, a conductive seed layer directly on the conductive pad, and a passivation layer encapsulating the conductive pad and the conductive seed layer. The conductive pad is between the interconnect layer and the conductive seed layer.

Integrated circuit test method and structure thereof

An integrated fan-out package includes a first redistribution structure, a die, a plurality of conductive structures, an encapsulant, and a second redistribution structure. The die is bonded to the first redistribution structure through flip-chip bonding. The conductive structures surround the die. The encapsulant encapsulates the die and the conductive structures. The second redistribution structure is disposed on the encapsulant and is electrically connected to the first redistribution structure through the conductive structures. The second redistribution structure includes at least one conductive pattern layer that is in physical contact with the encapsulant. Top surfaces of the conductive structures contacting the second redistribution structure are coplanar with a top surface of the encapsulant.

Integrated fan-out package, package-on-package structure, and manufacturing method thereof

A method includes forming a redistribution structure over a carrier, the redistribution structure having conductive features on a surface of the redistribution structure distal the carrier; forming a conductive pillar over the surface of the redistribution structure; attaching a die to the surface of the redistribution structure adjacent to the conductive pillar, where die connectors of the die are electrically coupled to the conductive features of the redistribution structure; and attaching a pre-made substrate to the conductive pillar through a conductive joint, where the conductive joint is on the conductive pillar and comprises a different material from the conductive pillar, where the conductive joint and the conductive pillar electrically couple the redistribution structure to the pre-made substrate.

Semiconductor package with dual sides of metal routing

A semiconductor structure includes a first die having a first surface and a second surface opposite to the first surface, a conductive bump disposed at the first surface, and an RDL under the conductive bump. The RDL includes an interconnect structure and a dielectric layer, and the interconnect structure is electrically connected to the first die through the conductive bump. The semiconductor structure further includes a molding over the RDL and surrounding the first die and the conductive bump, an adhesive over the molding and the second surface, and a support element over the adhesive. A method includes providing a first die having a first surface and a second surface, a redistribution layer over the first surface, and a molding surrounding the first die; removing a portion of the molding to expose the second surface; and attaching a support element over the molding and the second surface.

Semiconductor structure and method of manufacturing a semiconductor structure

Package structures are provided. A package structure includes an adhesive layer and a semiconductor substrate over the adhesive layer. The package structure also includes a connector over the semiconductor substrate. The package structure further includes a first buffer layer surrounding the connector and the semiconductor substrate and covering the adhesive layer. An interface between the adhesive layer and the first buffer layer is substantially level with a bottom surface of the semiconductor substrate. In addition, the package structure includes an encapsulation layer surrounding the first buffer layer. The package structure also includes a redistribution layer over the first buffer layer and the encapsulation layer.

Package structure

Multi-chip packages

An embodiment integrated circuit structure includes a substrate, a metal pad over the substrate, a post-passivation interconnect (PPI) structure over the substrate and electronically connected to the metal pad, a first polymer layer over the PPI structure, an under bump metallurgy (UBM) extending into an opening in the first polymer layer and electronically connected to the PPI structure, and a barrier layer on a top surface of the first polymer layer adjacent to the UBM.

Integrated circuit structure and method for reducing polymer layer delamination

A device includes a semiconductor die. The semiconductor die includes a device layer, an interconnect layer over the device layer, a conductive pad over the interconnect layer, a conductive seed layer directly on the conductive pad, and a passivation layer encapsulating the conductive pad and the conductive seed layer.

Structures and formation methods of a package structure are provided. The method includes forming a conductive structure over a carrier substrate and disposing a semiconductor die over the carrier substrate. The method also includes pressing a protective substrate against the carrier substrate at an elevated temperature to bond the protective substrate to the conductive structure. The method further includes forming a protective layer to surround the semiconductor die.

Structure and formation method of package structure with fan-out structure

Multi-chip wafer level packages

Structures and formation methods of a chip package are provided. The chip package includes a semiconductor die and a package layer partially or completely encapsulating the semiconductor die. The chip package also includes a conductive feature penetrating through the package layer. The chip package further includes an interfacial layer the interfacial layer continuously surrounds the conductive feature. The interfacial layer is between the conductive feature and the package layer, and the interfacial layer is made of a metal oxide material.

Structure and formation method for chip package

Methods of forming multi-chip wafer level packages

Growing community of inventors

Hsinchu, Taiwan

Hsien-Wen Liu