Intel Corporation

Qualcomm Incorporated

Other

Houssam Jomaa

Omar James Bchir

Islam A Salama

Ravi Kiran Nalla

Javier Soto Gonzalez

Kuiwon Kang

Chin-Kwan Kim

Charan K Gurumurthy

Rajneesh Kumar

Layal Rouhana

Yonggang Li

Milind Shah

Manuel Aldrete

Christine Tsau

Sun Yun

Ravi Tanikella

Mario Francisco Velez

Dilan Seneviratne

Siamak Fazelpour

David Fraser Rae

Marcus Hsu

Amruthavalli Palla Alur

Brigham Navaja

Seongryul Choi

Jiantao Zheng

Joan Rey V Buot

H Ryan Chase

Christopher Bahr

A substrate with an embedded stacked through-silicon via die is described. For example, an apparatus includes a first die and a second die. The second die has one or more through-silicon vias disposed therein (TSV die). The first die is electrically coupled to the TSV die through the one or more through-silicon vias. The apparatus also includes a coreless substrate. Both the first die and the TSV die are embedded in the coreless substrate.

Substrate with embedded stacked through-silicon via die

A device that includes a die and a substrate coupled to the die. The substrate includes a dielectric layer and a plurality of embedded interconnects. Each embedded interconnect located through a first planar surface of the substrate such that a first portion of the embedded interconnect is located within the dielectric layer and a second portion of the embedded interconnect is external of the dielectric layer. In some implementations, the substrate includes a core layer. In some implementations, the dielectric layer and the plurality of embedded interconnects may be part of a build up layer of the substrate.

High density embedded interconnects in substrate

A package that includes a substrate comprising an interposer interconnect and a cavity, a redistribution portion coupled to the substrate, the redistribution comprising a plurality of redistribution interconnects, and a first die coupled to the redistribution portion through the cavity of the substrate. A substantial region between a side surface of the first die and the substrate is free of an encapsulation layer. In some implementations, the substrate is free of a metal ring that surrounds the first die. In some implementations, the redistribution portion comprises a barrier layer and a first interconnect coupled to the barrier layer. The barrier layer is coupled to the interposer interconnect.

Low profile integrated package

A substrate that includes a first substrate portion, a second substrate portion and a second dielectric layer. The first substrate portion includes a core layer having a first core surface, and a plurality of core substrate interconnects, wherein the plurality of core substrate interconnects includes a plurality of surface core substrate interconnects formed over the first surface of core layer. The second substrate portion includes a first dielectric layer having a first dielectric surface, the first dielectric surface facing the first core surface of the core layer, and a plurality of substrate interconnects, wherein the plurality of substrate interconnects includes a plurality of interconnects formed over the first dielectric surface. The second dielectric layer is formed between the first substrate portion and the second substrate portion such that the plurality of surface core substrate interconnects and the plurality of substrate interconnects are located in the second dielectric layer.

High density interconnects in an embedded trace substrate (ETS) comprising a core layer

A device comprising a semiconductor die, a package substrate coupled to the semiconductor die, and an encapsulation layer that at least partially encapsulates the semiconductor die. The package substrate includes at least one stacked via. The at least one stacked via includes a first via and a second via coupled to the first via. The second via includes a seed layer coupled to the first via. The second via includes a different shape than the first via. The package substrate includes a prepreg layer. The package substrate includes a first pad coupled to the first via, and a second pad coupled to the second via.

Integrated circuit (IC) package and package substrate comprising stacked vias

A process for fabricating an Integrated Circuit (IC) and the IC formed thereby is disclosed. The process comprises providing a substrate. The process further comprises forming a plurality of longitudinal trenches in the substrate and depositing a layer of a first conductive material on at least one longitudinal trench of the plurality of longitudinal trenches. A first layer of a second conductive material is deposited on the layer of the first conductive material. Thereafter, the process includes depositing a second layer of the second conductive material on the first layer of the second conductive material. The second layer of the second conductive material at least partially fills the at least one longitudinal trench. The first conductive material is selected such that a reduction potential of the first conductive material is less than a reduction potential of the second conductive material.

Integrated circuit and process for fabricating thereof

In some embodiments, an improved mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers is presented. In this regard, a substrate build-up film is introduced having epoxy material and a plurality of epoxy microspheres, wherein an interior of the microspheres is not fully cured. Other embodiments are also disclosed and claimed.

Mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers

Methods and apparatus for formation of a semiconductor substrate with photoactive dielectric material, embedded traces, a padless skip via extending through two dielectric layers, and a coreless package are provided. In one embodiment, a method for forming a core having a copper layer; laminating the copper layer a photoactive dielectric layer; forming a plurality of trace patterns in the photoactive dielectric layer; plating the plurality of trace patterns to form a plurality of traces; forming an insulating dielectric layer on the photoactive dielectric layer; forming a via through the insulating dielectric layer and the photoactive dielectric layer; forming additional routing patterns on the insulating dielectric layer; removing the core; and applying a solder mask.

Substrate and method of forming the same

Some novel features pertain to a substrate that includes a first dielectric layer, a first interconnect, a first cavity, and a first electroless metal layer. The first dielectric layer includes a first surface and a second surface. The first interconnect is on the first surface of the substrate layer. The first cavity traverses the first surface of the first dielectric layer. The first electroless metal layer is formed at least partially in the first cavity. The first electroless metal layer defines a second interconnect embedded in the first dielectric layer. In some implementations, the substrate further includes a core layer. The core layer includes a first surface and a second surface. The first surface of the core layer is coupled to the second surface of the first dielectric layer. In some implementations, the substrate further includes a second dielectric layer.

Package substrate comprising surface interconnect and cavity comprising electroless fill

An apparatus includes a substrate having a land side having a plurality of contact pads and a die side opposite the land side. The apparatus includes a first die and a second die wherein the first die and second die are embedded within the substrate such that the second die is located between the first die and the land side of the substrate.

Multi-chip package having a substrate with a plurality of vertically embedded die and a process of forming the same

A hybrid package having a processor module disposed on a substrate and an auxiliary module disposed on a patterned lid. The auxiliary module may be a memory module, a power management integrated circuit (PMIC) module, and/or other suitable module, that are located in the package along with the processor module. Having the auxiliary module in the package with the processor module reduces the noise at the solder bump between the processor module and the substrate. Having the auxiliary module in the package with the processor module also allows other modules to be added to the package without increasing the area of the package.

Power management integrated circuit (PMIC) integration into a processor package

Some examples of the disclosure include a semiconductor package having a heat spreader, an outer perimeter portion attached to the bottom of the heat spreader along the perimeter and having a plurality of electrical pathways, a package substrate located below and spaced from the outer perimeter portion and having a plurality of electrical pathways, a plurality of connection points located between the outer perimeter component and the package substrate to provide connection points coupling the plurality of electrical pathways of the outer perimeter portion to the plurality of electrical pathways in the package substrate, and a cavity formed on the bottom of the heat spreader inside the outer perimeter portion.

Systems, apparatus, and methods for heat dissipation

A microelectronic device mounting substrate includes a bond pad with a side wall and an upper surface. A dielectric first layer is disposed on the mounting substrate and a solder mask second layer is disposed on the dielectric first layer. A uniform recess is disposed through the solder mask second layer and the dielectric first layer that exposes the portion of the bond pad upper surface.

Dual epoxy dielectric and photosensitive solder mask coatings, and processes of making same

Some features pertain to an integrated device that includes a first substrate, a first solder resist layer coupled to the first substrate, a second solder resist layer coupled to the first solder resist layer, and an opening in the first and second solder resist layers, the opening comprising a sidewall completely covered with the second solder resist layer, where a sidewall of the second solder resist layer covers a sidewall of the first solder resist layer. In some implementations, the opening is at least partially filled with an electrically conductive material. The electrically conductive material includes one of solder and/or an interconnect. The integrated device includes a first interconnect coupled to the electrically conductive material. The first interconnect is one of at least a solder, and/or an interconnect ball. In some implementations, the integrated device includes a pad coupled to the substrate, and a first interconnect coupled to the pad.

Growing community of inventors

Phoenix, AZ, United States of America

Houssam Jomaa