Qingdao University of Technology

Qingdao 5d Intelligent Additive Manufacturing Technology Co., Ltd.

Qingdao Technological University

Northwestern Polytechnical University

Qingdao Bona Optoelectronics Equipment Co., Ltd.

Hongbo Lan

Xiaoyang Zhu

Quan Xu

Jiawei Zhao

Guangming Zhang

Pengfei Guo

Fei Wang

Daosen Song

Zun Yu

Wenhai Li

Yansong Liu

Xin Lin

Zhenghao Li

Jiachang Wang

Hui Huang

Jiawe Zhao

Lin Wu

Hongke Li

Ximeng Qi

Jianjun Yang

Yucheng Ding

Mingyang Liu

Jin Jiang

The present disclosure provides a method and a system for manufacturing a flexible transparent conductive film with an embedded metal material. The method comprises the steps of sequentially printing metal nanowire grids and metal grids with a large aspect ratio on a printing substrate through an electric field driven micro-nano 3D printing method, and forming a composite conductive electrode of the metal grids and the metal nanowire grids; performing conductive treatment on the composite conductive electrode to obtain an electrode material; and embedding the electrode material into a photoresist, separating the photoresist embedded with the electrode material from the printing substrate, and removing the printing substrate to obtain a conductive film, wherein the metal nanowire grids are formed by printing the metal nanowires, and the metal grids with a large aspect ratio are formed by printing nano metal paste.

Method and system for manufacturing flexible transparent conductive film with embedded metal material

Disclosed are a method for improving a surface quality of an alloy micro-area via a supersaturated film and use thereof. The method includes: adding nickel chloride to a sodium chloride-ethylene glycol electrolyte until the electrolyte is saturated, and conducting electrochemical machining.

Method for improving surface quality of alloy micro-area via supersaturated film and use thereof

A composite transparent film, a preparation method thereof and a method for continuous digital light processing ceramic 3D printing based on the same are provided. The method selects a mixture of silica microspheres and PDMS to form a composite film on which silica is used to form a hydrophobic layer. Combined with specific optimized parameters, the film is more suitable for continuous digital light processing ceramic 3D printing, which can realize the continuous printing of ceramic slurries, solve the problem of delamination of printed pieces obtained by the existing 3D printing method of ceramics, improve the printing accuracy, and decrease the printing costs.

Composite transparent film, preparation method thereof, and method for continuous digital light processing ceramic 3D printing based on the same

A 3D printing device and method for integrated manufacturing of functionally gradient materials and three-dimensional structures. The device includes an active and passive mixing and printing module and a constraining and sacrificial layer printing module. An input end of the active mixing module connects to multiple anti-settling feeding modules, and an output end of the active mixing module connects to the passive mixing and printing module. The passive mixing and printing module and the constraining and sacrificial layer printing module are mounted on one side of an XYZ three-axis module. The constraining and sacrificial layer printing module connects to a constraining and sacrificial layer feeding module and prints and forms a functionally gradient three-dimensional structure. The 3D printing device and method of the invention can realize integrated manufacturing of continuous functionally gradient materials and complex three-dimensional structures, and have the advantages of high printing efficiency and low cost.

3D printing device and method for integrated manufacturing of functionally gradient materials and three-dimensional structures

A method and apparatus for mass production of AR diffractive waveguides. Low-cost mass production of large-area AR diffractive waveguides (slanted surface-relief gratings) of any shape. Uses two-photon polymerization micro-nano 3D printing to realize manufacturing of slanted grating large-area masters of any shape (thereby solving the problem about manufacturing of slanted grating masters of any shape on the one hand, realizing direct manufacturing of large-size wafer-level masters on the other hand, and also having the advantages of low manufacturing cost and high production efficiency). Composite nanoimprint lithography technology is employed (in combination with the peculiar imprint technique and the composite soft mold suitable for slanted gratings) to solve the problem that a large-slanting-angle large-slot-depth slanted grating cannot be demolded and thus cannot be manufactured, and realize the manufacturing of the slanted grating without constraints (geometric shape and size).

Method and apparatus for mass production of AR diffractive waveguides

A manufacturing method of an embedded metal mesh flexible transparent electrode and application thereof; the method includes: directly printing a metal mesh transparent electrode on a rigid substrate by using an electric-field-driven jet deposition micro-nano 3D printing technology; performing conductive treatment on a printed metal mesh structure through a sintering process to realize conductivity of the metal mesh; respectively heating a flexible transparent substrate and the rigid substrate to set temperatures; completely embedding the metal mesh structure on the rigid substrate into the flexible transparent substrate through a thermal imprinting process; and separating the metal mesh completely embedded into the flexible transparent substrate from the rigid substrate to obtain the embedded metal mesh flexible transparent electrode. The mass production of the large-size embedded metal mesh flexible transparent electrode with low cost and high throughput by combining the electric-field-driven jet deposition micro-nano 3D printing technology with the roll-to-plane thermal imprinting technology.

Manufacturing method of embedded metal mesh flexible transparent conductive film and application thereof

The present invention discloses a 3D printing apparatus and method of using a single-printhead to achieve multi-material and multi-scale printing. The apparatus comprises a base, a worktable, a wafer stage, a substrate, a power source, a printhead, and a support. The printhead is provided with a plurality of material inlets, each of which is connected to a different micro-feeding pump; and multiple materials are thoroughly mixed under the action of an agitator after being fed into the printhead, thereby achieving multi-material printing. In the present invention, a macroscopic geometrical shape of a printed object, microstructures in the interior and on the surface of the object are reasonably controlled, and integrated manufacturing of multi-scale structures is achieved.

3D printing apparatus and method of using the single-printhead achieved multi-material and multi-scale printing

The present invention discloses a nanoimprint apparatus and method useful in the cost-effective mass production of nanostructures over large areas on various substrates or surfaces, especially suitable for non-flat substrates or curved surfaces. The nanoimprint apparatus is composed of a wafer stage, a vacuum chuck, a substrate, a UV-curable nanoimprint resist and the like. The method implementing large-area nanopatterning based on the apparatus includes the following steps: (1) pretreatment, (2) imprinting, (3) curing, (4) demolding, (5) post treatment and (6) transferring of imprinted patterns. By utilizing the apparatus and the approach, large-area, and/or high-aspect-ratio micro/nanostructures can be mass produced, especially on a non-flat substrate or a curved surface or a fragile substrate at low cost and high throughput.

Large-area nanopatterning apparatus and method

The present application relates to a full wafer nanoimprint lithography device comprises a wafer stage, a full wafer coated with a liquid resist, a demolding nozzle, a composite mold, an imprint head, a pressure passageway, a vacuum passageway and a UV light source. The present application also relates to an imprinting method using the full wafer nanoimprint lithography device comprises the following steps: 1) a pretreatment process; 2) an imprinting process; 3) a curing process; and 4) a demolding process. The device and the method can be used for high volume manufacturing photonic crystal LEDs, nano patterned sapphire substrates and the like in large scale patterning on the non-planar surface or substrate.

Method and device for full wafer nanoimprint lithography

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Qingdao, China

Hongbo Lan