Carl Zeiss Smt Gmbh

Holger Maltor

Martin Weiser

Claudia Ekstein

Udo Dinger

Johannes Lippert

Heiko Siekmann

Stefan Burkart

Stefan Burkhart

Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates () including a base body () made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body () is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer () is preferably provided on a polishing layer () of the substrate () of the EUV mirror ().

Substrate for an EUV-lithography mirror

Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body () and a polishing layer (). The polishing layer () has a thickness of less than 10 &#x3bc;m and a root-mean-square roughness of less than 0.5 nm and the main body () is produced from an aluminum alloy. Moreover, a highly reflective layer () is provided on the polishing layer () of the substrate () of the EUV mirror ().

Substrate for mirrors for EUV lithography

A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, whereby the surface is lowered and/or removed at least partially, and wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed in accordance with the method.

Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements

A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.

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Aalen, Germany

Holger Maltor