Tokyo Electron Limited

Hitoshi Hashima

Makoto Muramatsu

Michiaki Matsushita

Takeshi Hirao

Norihiko Sasagawa

Hidekazu Kiyama

Tohru Tochihara

A solution treatment apparatus performs a solution treatment on a substrate using treatment solution. The solution treatment apparatus includes a substrate holder that rotates and holds the substrate; a nozzle that supplies the treatment solution to the substrate on the substrate holder, and raising and lowering pins that raise and lower the substrate above a stage for the substrate. One or more of the pins has a main body having a conductivity; and an inductor part provided outside the main body, The main body has a top portion that comes into contact with the substrate and supports the substrate. A side of the main body opposite to the top portion across the inductor part is directly or indirectly grounded.

Substrate support member, substrate treatment apparatus, and substrate transfer apparatus

A substrate transfer apparatus includes: a non-conductive support with an upper surface that faces a substrate and supports the substrate; a mover that moves the support to transfer the substrate; a connector that connects the support and the mover while being grounded; a conductive contact that is provided on the upper surface of the support, and supports the substrate in contact with a lower surface of the substrate such that the substrate is not brought into contact with the support; a strip-shaped conductive path that is provided to connect the contact and the connector. The strip-shaped conductive path is provided with a bent portion such that an interval of the strip-shaped conductive path formed by the bent portion is at least twice a width of the strip-shaped conductive path.

Substrate transfer apparatus and substrate transfer method

An operating method of a processing liquid supply apparatus which supplies a processing liquid to a substrate from a processing liquid supply path via a nozzle includes measuring a surface potential of a first electrode which is configured to be in contact with the processing liquid of the processing liquid supply path. The operating method further includes displaying the measured surface potential in the measuring of the surface potential of the first electrode.

Operating method of processing liquid supply apparatus and recording medium

An electrode rodserving as a first electrode is provided to be in contact with a flow path member and a processing liquid of a processing liquid supply path. If the processing liquid is flown in the processing liquid supply path, static electricity is generated by friction so that the processing liquid and the flow path member is electrically charged. By allowing the electrode rodto be closely contacted with the flow path member, the amount of electric charges corresponding to the sum of the charge amounts of the processing liquid and the flow path member is measured as a surface potential of the first electrode by a surface potential measuring unit. The measured surface potential is displayed on a display unit

Processing liquid supply apparatus, operating method of processing liquid supply apparatus, and recording medium

A process liquid supply nozzle comprises a substantially tubular main nozzle provided with a discharge port for discharging a coating liquid, a substantially bowl-shaped nozzle holder provided with a through-hole into which the main nozzle can be inserted, and a free space formed between the inner circumferential surface of the nozzle holder and the outer circumferential surface of the main nozzle, at least a prescribed cleaning liquid being supplied into the free space. The nozzle holder or the nozzle is relatively movable in the vertical direction such that the coating liquid is discharged from the discharge port under the state that the discharge port of the main nozzle projects downward from the through-hole, and the nozzle is cleaned with the cleaning liquid under the state that the nozzle is housed in the nozzle holder.

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Koshi, Japan

Hitoshi Hashima