Kyocera Corporation

Hitoshi Atari

Masaki Terazono

Katsushi Sakaue

Kazuhiro Kuchimachi

Yasushi Migita

Naohito Higashi

Shoji Kosaka

Junji Ohe

Ichio Kiyofuji

Electrostatic chuck

An electrostatic chuck comprising a chucking body of a dielectric ceramics and an electrostatic inner electrode embedded in the chuck (first invention), the ceramics having a volume resistivity value not more than 10.sup.13 .OMEGA.cm at a high temperature not less than 250.degree. C. This electrostatic chuck can properly chuck, fix, carry and correct wafers even at a high temperature not less than 250.degree. C. in CVD, PVD or high temperature etching apparatuses. An electrostatic chuck comprising a chucking body of a single-crystalline sapphire and an electrostatic inner electrode embedded in the chuck (second invention). This electrostatic chuck is characterized by extremely small leak current, high mechanical strength and strong chucking force even in the temperature range of room temperature to 500.degree. C. and in the voltage range of 500 to 2000 V. With this electrostatic chuck, objects to be chucked, such as silicon wafers, are less contaminated.

Growing community of inventors

Kokubu, Japan

Hitoshi Atari