Ps4 Luxco S.a.r.l.

Elpida Memory, Inc.

Other

Micron Technology Incorporated

Nec Corporation

Powerchip Semiconductor Manufacturing Corporation

Hisayuki Nagamine

Koji Yasumori

Tomohiro Kitano

Minoru Yamagami

Kazuhiro Yoshida

Takashi Ishihara

Toshinao Ishii

Takamitsu Onda

Hayato Oishi

Yuki Miura

Kenichi Echigoya

Machio Segawa

Shuichi Nagase

A sub-sense amplifier includes a semiconductor substrate, a first pair of complementary transistors, a second pair of complementary transistors, and at least one ground transistor. The first pair and second pair of complementary transistors and the ground transistor are formed on the semiconductor substrate. The first pair of complementary transistors are disposed in line symmetry with a center line of the sub-sense amplifier as a symmetry axis, and gates of the first pair of complementary transistors are coupled to a node. The second pair of complementary transistors are also disposed in line symmetry with the center line, wherein the current directions of the second pair of complementary transistors are the same. Sources and drains of the first pair of complementary transistors are coupled to gates and sources of the second pair of complementary transistors, respectively. The ground transistor connects in series with the second pair of complementary transistors.

Sub-sense amplifier layout scheme to reduce area

Disclosed here is an apparatus that comprises an amplifier having first and second input nodes, first and second resistors, a first electrostatic discharge protection circuit coupled between the first input node and the first resistor, and a second electrostatic discharge protection circuit coupled between the second input node and the second resistor.

Semiconductor device including amplifier

One semiconductor device includes nine surface micro-bumps laid out in a 3&#xd7;3 matrix on a semiconductor substrate, a transistor that contains first and second diffusion layers formed on the semiconductor substrate, and power-supply wiring laid out on the semiconductor substrate. The aforementioned first diffusion layer is connected to one of the surface micro-bumps, the second diffusion layer is connected to the power-supply wiring, and the transistor is laid out in the region between the surface micro-bumps located on one edge in an X direction and the surface micro-bumps located on the other edge in said X direction.

Semiconductor device

Disclosed herein is a device that includes: first and second memory cell arrays arranged in a first direction; a plurality of first bump electrodes disposed between the first and second memory cell arrays and arranged in line in a second direction crossing the first direction; a plurality of second bump electrodes disposed between the first bump electrodes and the second memory cell arrays and arranged in line in the second direction; a first area being between the first and second bump electrodes; a plurality of third bump electrodes disposed in the first area; and a first capacitor formed in the third area.

Semiconductor device having compensation capacitor to stabilize power supply voltage

Disclosed herein is a device that includes: first lines formed on a first wiring layer extending in a first direction; second lines formed on a second wiring layer extending in a second direction; and conductor plugs connecting the first lines to the second lines such that the first and second lines form a mesh-structure wiring. The first lines include first enlarged portions at intersection positions where the first and second lines cross to each other, a width in the second direction of the first enlarged portions is wider than a line width of the first lines at other than the intersection position. The second lines include second enlarged portions at the intersection positions, a width in the first direction of the second enlarged portions is wider than a line width of the second lines at other than the intersection position.

Semiconductor device having mesh-pattern wirings

A semiconductor device is disclosed, which includes first and second power supply pads supplied with first and second power voltages, respectively, a first protection circuit coupled between the first and second power supply pads, and an internal circuit including a first power line and a plurality of transistors electrically coupled to the first power line. The first power line includes first and second portions, and the first portion is electrically connected to the first power supply pad. The device further includes a second protection circuit coupled between the second portion of the first power line and the second power supply pad.

A semiconductor device comprises a first external terminal having a first size, a plurality of second external terminals each having a second size smaller than the first size, an external terminal area in which the first external terminal and the second external terminals are arranged, and a plurality of wires connecting between the second external terminals and a plurality of circuits formed adjacent to the external terminal area and corresponding to the second external terminals. The second external terminals and the wires constitute a plurality of interfaces. Each of the interfaces includes at least one adjustment portion that adjusts a time constant of the wire so that the wires have the same time constant. At least part of the adjustment portions is located in a margin area produced in the external terminal area by a difference between the first size and the second size.

A semiconductor device with a power wiring system. The device includes a multi-level wiring structure including a lower-level wiring layer and an upper-level wiring layer over the lower-level wiring layer, and the power wiring system includes a first power supply line and a second power supply line provided as the first-level wiring layer and extending in a first direction in substantially parallel to each other, a third power supply line provided as the upper-level wiring layer and extending in the first direction with overlapping the first power supply line, the first and third power supply lines conveying first and second power voltages, respectively, which are different from each other, and a fourth power supply line provided as the upper-level wiring layer and extending in the first direction with overlapping the second power supply line, the second and fourth power supply lines conveying the second and first power voltages, respectively.

Semiconductor device with power supply line system of reduced resistance

A plurality of buffer circuits and data buses coupled to the buffer circuits are included in a device. Each of the data buses includes first and second portions. The first portions of the data buses are arranged at a first pitch in the second direction, and the second portions of the data buses are arranged at a second pitch in the second direction, the second pitch being smaller than the first pitch.

Semiconductor device having plural data buses and plural buffer circuits connected to data buses

Disclosed herein is a device that includes: first and second memory mats each including a plurality of bit lines; a sense area arranged between the first and second memory mats; a column selection line provided on the first memory mat; and a compensation capacitance provided on the second memory mat. The sense area includes a plurality of sense amplifiers. Each of the sense amplifiers is connected to an associated one or ones of the bit lines. At least one of the sense amplifiers is selected based on a column selection signal supplied via the column selection line. At least a part of the compensation capacitance is formed in a same wiring layer as the column selection line.

Semiconductor device having compensation capacitance

A semiconductor device includes first and second wirings formed in a first wiring layer and extending parallel to an X direction, third and fourth wirings formed in a third wiring layer and extending parallel to a Y direction; fifth and sixth wirings formed in a second wiring layer positioned between the first and second wiring layers, a first contact conductor that connects the first wiring to the third wiring; and a second contact conductor that connects the second wiring to the fourth wiring. The first and second contact conductors are arranged in the X direction. Because the first and second contact conductors that connect wiring layers that are two or more layers apart are arranged in one direction, a prohibited area that is formed in the second wiring layer can be made narrower.

Semiconductor device having plurality of wiring layers and designing method thereof

A semiconductor device comprises a first region and a second region. The first region includes a plurality of memory cells each of which holds respective data and a plurality of sense amplifiers that respectively amplify the data in the plurality of memory cells, based on a first voltage. The second region is provided along one side of the first region and includes a first power supply generation circuit that generates the first voltage, based on a second voltage. The second voltage being supplied to the first power supply circuit by a first power supply interconnect extends on the first region in a first direction parallel to the one side of the first region.

Disclosed herein is a device that includes first and second ports arranged in a first direction and first and second circuits arranged between the first and second ports. The first and second ports are coupled to the first and second circuits, respectively. The first and second circuits include first and second sub circuits that control an operation timing thereof based on a timing signal, respectively. The control signal is transmitted through a control line extending in a second direction. Distances between the control line and the first and second sub circuits in the first direction are the same as each other. A coordinate of the control line in the first direction is different from an intermediate coordinate between coordinates of the first and second ports in the first direction.

Semiconductor device having plural circuit blocks operating at the same timing

A transistor of a characteristic checking element has a gate electrode connected to a measurement pad disposed in a dicing line and to an internal measurement pad disposed inside a semiconductor device. In a P/W process, a gate insulating film of the transistor is broken by an electric voltage applied via the internal measurement pad. Since the gate insulating film of the transistor is broken, a new current path is formed. Thus, measurement of accurate characteristics of the characteristic checking element is inhibited.

Growing community of inventors

Tokyo, Japan

Hisayuki Nagamine