Kabushiki Kaisha Toshiba

Nuflare Technology, Inc.

Hiroyuki Tanizaki

Hiromu Inoue

Hiroyuki Ikeda

Takeshi Fujiwara

Shuichi Tamamushi

Takanao Touya

Eiji Sawa

Hidenori Sato

Kentaro Okuda

Hiroshi Tsukada

Yosuke Okamoto

Ryoji Yoshikawa

Tomohide Watanabe

Naoko Toyoshima

Yasunori Takase

A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.

Inspection system and method for inspecting line width and/or positional errors of a pattern

A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.

Pattern inspection device and method of inspecting pattern

An unevenness inspection method for inspecting presence of unevenness in a panel material, the method includes: acquiring a plurality of primary images by imaging the panel material under inspection on a plurality of levels of condition; creating a plurality of secondary images by processing the plurality of primary images to enhance variation of the image; creating a composite image by combining the plurality of secondary images with a prescribed weighting; and determining the presence of unevenness using the composite image, the prescribed weighting being determined so that a region having the unevenness can be distinguished from the other region, when the plurality of secondary images are created for the panel material for training use having unevenness and are combined into a composite image.

Unevenness inspection method, method for manufacturing display panel, and unevenness inspection apparatus

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Mie, Japan

Hiroyuki Tanizaki