Canon Kabushiki Kaisha

Gigaphoton Inc.

Shiseido Company, Limited

Kabushiki Kaisha Toshiba

Japan Tobacco Inc.

Hiroshi Tanaka

Osamu Wakabayashi

Masaaki Imaizumi

Shigeyuki Uzawa

Yoshio Kaneko

Noburu Takakura

Akiya Nakai

Kazuhiko Mishima

Takuji Maruta

Takashi Saito

Toru Suzuki

Masato Moriya

Takashi Matsumoto

Michio Kohno

Tetsuya Kanbe

Hiroshi Tsukamoto

Tomiyuki Nanba

Yoshikazu Kobayashi

Kenichi Tomita

Nozomu Hayashi

Keiichi Uehara

Sachio Tsunoda

Tadashi Aoki

Satoshi Tanaka

Hideyuki Hayashi

Shinkichi Takahashi

Toshiaki Kobayashi

Ichiro Yamagata

Masaaki Ishiwatari

Akihiko Kurosu

Toshio Yoneyama

Ikuo Soma

Yoshiyuki Ogusu

Hiroyuki Masuda

Hideo Morohoshi

Yoshinori Makita

Giichi Marushima

Katsutake Hayashi

Satoru Bushida

Hakuji Katsura

Shusei Tsukada

Kimio Ohno

Motoharu Nakane

Hideyuki Ochiai

Akira Terasaki

Shigeto Fujiki

Takashi Isa

Naoto Nitta

Touru Takahashi

Michihisa Katada

Hidenori Watanabe

Michihiro Hirooka

Hiroyuki Ito

Hiroshi Isoyama

Ken Katsukura

A laser apparatus may include: a mirror configured to reflect a laser beam; an actuator configured to operate the mirror; and a controller configured to transmit a movement instruction to the actuator, wherein the controller predicts a movement completion time of the actuator, and transmits a polling signal so that the actuator receives the polling signal after expiration of the predicted movement completion time.

Laser apparatus and extreme ultraviolet light generation system

A light source apparatus according to an embodiment may be used for an exposure apparatus which exposes a plurality of wafers by repeating a wafer exposure for exposing a total exposure area of each wafer. The wafer exposure may include a sequential execution of scanning exposures in which each divided area defined by dividing the total exposure area of each wafer is scanned by pulsed light. The apparatus may comprise: a light source controller configured to execute a control for outputting the pulsed light based on a luminescence trigger signal received from the exposure apparatus; a detector configured to detect a characteristic of the pulsed light; and a data collection processor configured to collect at least a piece of data in data included in a pulse light data group related to the pulsed light detected by the detector and a control data group related to the control, and execute a mapping process of mapping the collected data by at least one of scanning exposure basis and wafer exposure basis.

Light source apparatus and data processing method

In an extreme ultraviolet light generation apparatus, a target detection section may include a light source, a transfer optical system, an image sensor configured to output image data of an image that has been formed by irradiating a target outputted from a target supply device with light outputted from the light source on a light-receiving unit of the image sensor by the transfer optical system, and a processing unit, connected to the image sensor, configured to receive the image data, obtain a first optical intensity distribution along a first line that intersects with a trajectory of the target and a second optical intensity distribution along a second line that intersects with the trajectory, calculate a center of gravity position in the first optical intensity distribution and a center of gravity position in the second optical intensity distribution, and calculate an actual path of the target based on the calculated positions.

Extreme ultraviolet light generation apparatus

A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.

Laser device for exposure apparatus

The present invention provides a lithography apparatus for forming a pattern on a substrate, including a motor configured to drive a table for holding the substrate in accordance with a driving profile, a setting unit configured to set one of a normal mode and a power saving mode as an operation mode of the motor, and a controller configured to change the driving profile when the power saving mode is set, such that an amount of generated heat of the motor caused by driving of the table is smaller than that in the normal mode, and the number of substrates to be processed by the lithography apparatus per unit time is satisfied.

Lithography apparatus and method of manufacturing article

A master oscillator system may include a grating configured to function as one resonator mirror in an optical resonator, a spectral bandwidth tuning unit configured to tune the spectral bandwidth of a laser beam transmitted within the optical resonator, a storage unit configured to store a control value of the spectral bandwidth tuning unit corresponding to a desired spectral bandwidth and a controller configured to control the spectral bandwidth tuning unit based on the control value stored in the storage unit.

Master oscillator system and laser apparatus

An apparatus exposes a substrate via a pattern of a reticle using pulsed light generated by a light source, and includes a controller configured to control the light source so that the oscillation frequency of the light source changes periodically while the apparatus exposes the substrate. The oscillation frequency is the number of times of emission of the light source per unit time.

Exposure apparatus, light source apparatus and method of manufacturing device

An exposure apparatus for exposing an object to light. The apparatus includes a camera which captures an image of a mark on the object to obtain image data corresponding to the image, an extraction section which extracts an edge position in the image data obtained by differentiating the image data, a determination section which determines a position of the mark by comparing the extracted edge position with a template, and a control section which changes at least one of a parameter used by the extraction section and a parameter used by the determination section, based on a result of the comparing by the determination section. The object to be exposed is positioned based upon the position of the mark determined by the determination section.

Position detection apparatus and exposure apparatus

A position detection method of detecting a position of a detection mark. The method includes a matching step of calculating a value of a correlation using a template for an image including the detection mark, a change step of changing the template to be used for the correlation, a repeat step of, when a value of a correlation in the matching step is not more than a predetermined value, changing the matching processing while changing the template in the change step, and a step of performing position detection on the basis of a result of correlation in the matching step or the repeat step.

Position detection apparatus and method

An apparatus which exposes a substrate to radiant energy includes a unit which holds a first mask having a pattern which includes a pattern of a target mark, a unit which projects a pattern of radiant energy to the substrate through the first mask, a unit which holds a second mask having an auxiliary pattern for identifying the target mark to be formed on the substrate, and a unit which controls the projecting unit so as to project a pattern of radiant energy to the substrate through the second mask.

Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate

An apparatus for detecting a position of a target mark out of a plurality of marks in a region of an object to obtain a position of the region of the object. The apparatus includes a scope configured to sense a first image of the object at a first magnification and a second image of the object at a second magnification higher than the first magnification, and a processor configured to extract, from the first image, a position of a first mark out of the plurality of marks and a feature of a region outside the first mark, to identify the first mark based on the extracted feature, to extract, from the second image, a position of the target mark, to evaluate reliability of the extracted position of the target mark, to select a second mark, different from the target mark, from the plurality of marks as a new target mark based on the evaluated reliability and the identified first mark in order to extract a position of the selected second mark from an image sensed by the scope at the second magnification.

Position detection apparatus

An alignment mark includes a first mark usable for global alignment measurement in the direction of a scribe line, and a second mark usable for pre-alignment measurement in a direction perpendicular to the direction of the scribe line. The first mark is formed by arranging a plurality of strip-shaped X measurement marks whose longitudinal direction is perpendicular to the direction of the scribe line. In the second mark, strip-shaped second measurement marks are arranged at the two ends of the first mark such that the longitudinal direction of the second measurement mark is perpendicular to that of the first measurement mark. The alignment mark can be shared by global alignment and pre-alignment, and applied to a narrow scribe line.

Alignment mark, alignment apparatus and method, exposure apparatus, and device manufacturing method

An exposure apparatus for exposing a substrate to a pattern. The apparatus includes a stage configured to hold the substrate and to move, a driving unit configured to drive the stage, a plurality of cameras, each of the plurality of cameras being configured to sense an image of a mark for alignment of the substrate, the plurality of cameras including at least two cameras of which specifications are different from each other, a camera controller configured to supply a sync signal common to the plurality of cameras, to cause the plurality of cameras to execute image sensing based on the common sync signal, and to measure position of the mark based on the sensed image, and a drive controller configured to control the driving unit based on information provided by the camera controller. The common sync signal includes a common horizontal sync signal having a first horizontal period. One of the at least two cameras includes an image sensing element having a specification in which the image sensing element operates in accordance with a horizontal sync signal having a second horizontal period, and the one camera drives the image sensing element in accordance with the common horizontal sync signal by using, as one horizontal period, at least a common multiple of the first and second horizontal periods.

Camera system, control method thereof, device manufacturing apparatus, exposure apparatus, and device manufacturing method

A position detection apparatus for detecting a position of a mark on an object includes a camera which captures an image of the mark, an extraction section which extracts a plurality of edge positions of the mark based on a signal derived from the image of the mark, each of the edge positions being associated with a combination of a direction and a polarity of the signal, and a determination section which determines a position of the mark, by comparing each of the plurality of extracted edge positions with a corresponding one of templates prepared for the respective combinations.

An exposure apparatus which projects a pattern of an original onto a substrate. The apparatus includes an original stage which supports the original, a substrate stage which supports the substrate, a reference pattern which is arranged on the original stage and to align the original stage and the substrate stage, and a mark, which is arranged on the original stage, has a known relative position from the reference pattern, and is to be projected onto the substrate to form an alignment mark on the substrate.

Exposure apparatus and exposure method

Growing community of inventors

Tochigi, Japan

Hiroshi Tanaka