Canon Kabushiki Kaisha

Hiroshi Nakazato

Takahiro Akamatsu

Takashi Matsumura

Mamoru Iijima

Kenji Fukui

Gen Nakamura

Satoshi Yoshinari

A semiconductor exposure apparatus includes an exposure stage for holding a substrate when a predetermined exposure process is performed to the substrate, a transfer station for receiving a substrate from a resist coating unit, the transfer station having a temperature adjusting device for adjusting a temperature of the substrate, and a conveying device for conveying a substrate from the transfer station to the exposure stage.

Substrate conveying system and device manufacturing method using the same

In a substrate conveying system, the temperature adjustment for a substrate is performed by use of a temperature adjusting plate which is provided at a substrate transfer station where a substrate can be transferred from or to an outside structure, by which the substrate temperature adjustment can be accomplished without a decrease of a processing speed of a semiconductor manufacturing apparatus and without deposition of contaminations.

A container for containing therein a plate-like article, such as a reticle, includes a bottom member having a holding portion for holding the article in a substantially laid-down state; an upper member to be mated with the bottom member to define a space above the upper surface of the article; a pressing member for resiliently pressing in the space the article against the holding portion; and a fixing portion having an engaging member being supported by the upper member and being engageable with an end portion of the bottom member. The engaging member is effective to prevent upward opening motion of the upper member due to a reaction force of the pressing member. In addition, a releasing portion is partially projectable into the fixing portion to press the same in the same direction as the direction of the opening motion of the upper member to thereby release the engaging member.

Container for a plate-like article

A device for detecting a position of an edge of a disk-like workpiece having an outer periphery whose shape includes a portion bearing positional information related to the workpiece, the device including a system for rotationally moving the workpiece; an illuminating system; and a photodetecting system; wherein the illuminating system and the photodetecting system are disposed so as to sandwich therebetween an outer peripheral portion of the workpiece when it is rotationally moved by the moving system and wherein the illuminating system projects, toward the photodetecting system, a light beam having an elongated shape in cross-section.

Device for positioning a semi-conductor wafer

A device for positioning a disk-like workpiece, the device having a system for detecting a change in position of an edge of the workpiece, the detecting system producing a signal; a system for selecting a portion of the signal produced by said detecting means, which portion contains desired positional information, the selecting means producing a signal; and a positioning system for rotating the workpiece on the basis of the signal produced by the selecting system, to thereby position the workpiece.

A dust-proof container for keeping therein a mask or reticle usable to transfer a pattern onto a semiconductor wafer for the manufacture of integrated circuits, is disclosed. The container includes a casing within which supporting pins for supporting the mask or reticle are formed. Also, in the casing, there are provided leaf springs for pressing the mask or reticle toward the supporting pins, and a releasing mechanism for releasing the reticle pressing force of the leaf springs. The releasing mechanism is responsive to a non-mechanical signal such as an electric signal to release the reticle pressing force. A shape memory alloy may be usable in the releasing mechanism. An opening/closing mechanism is provided to open/close a door which is operable to cover an opening formed in the casing for the insertion and extraction of the mask or reticle. A shape memory alloy may be used in the opening/closing mechanism. With the dust-proof container of the present invention, the necessity of use of a mechanical-signal transmitting system such as a linkage or otherwise in the casing is avoided. This effectively prevents creation of dust or foreign particles within the casing due to mechanical friction contact. Also, the possiblity of adhesion of dust or foreign particles to the mask or reticle contained in the container can be minimized.

Dust-proof container having improved construction for holding a reticle

A dust-tight container suitably usable in the manufacture of semiconductor microcircuits, for keeping therein a plate-like member such as a reticle, a photomask or a wafer is disclosed. The container has an elastomeric sealing member which is provided along an engaging portion between a container casing and a cover or door of the container, to achieve sufficiently complete dust-tight property of the container to thereby effectively prevent dust or foreign particles from entering into the container. At an engaging portion between the door and the container casing, a protrusion and a recess which mate at the time of closing of the door are provided. These mating protrusion and recess are formed at positions which are on the inner side of the elastomeric sealing member. This effectively prevents particles, adhered to the sealing member and scattering at the time of opening/closing of the door, from entering into the container.

Growing community of inventors

Ohme, Japan

Hiroshi Nakazato