Hitachi High-tech Corporation

Tocalo Co., Ltd.

Hiroho Kitada

Tsutomu Nakamura

Hideki Kihara

Kazuumi Tanaka

Takeshi Takabatake

Hironori Kusumoto

Masatoshi Kawakami

Yutaka Omoto

Kentaro Seto

Akira Itoh

Tomohiro Nakasuji

Hidenobu Tanimura

A Johnsen-Rahbek force type electrostatic chuck including: a metal substrate; an electrode for electrostatic attraction provided on the metal substrate with an insulating layer interposed between the metal substrate and the electrode for electrostatic attraction; and a dielectric layer constituting an electrostatic attraction surface in contact with a workpiece. The dielectric layer includes a ceramic spray coating and a sealing component with which pores of the ceramic spray coating are filled, and the sealing component contains a metal organic salt containing a rare earth element.

Electrostatic chuck and processing apparatus

In a plasma processing apparatus, an additional viewing window is disposed between an infrared temperature sensor and a view window, and the additional viewing window is cooled to be retained at room temperature (20&#xb0; C. to 25&#xb0; C.), to reduce and to stabilize electromagnetic waves emitted from the viewing window. By correcting the value of the electromagnetic waves, the measurement precision of the temperature monitor is increased and it is possible to measure and to control the dielectric window temperature in a stable state.

Plasma processing apparatus

Growing community of inventors

Tokyo, Japan

Hiroho Kitada