Growing community of inventors

Nirasaki, Japan

Hidehito Saigusa

Average Co-Inventor Count = 4.23

ph-index = 8

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 195

Hidehito SaigusaDaisuke Hayashi (96 patents)Hidehito SaigusaHiroyuki Nakayama (11 patents)Hidehito SaigusaJun Ozawa (33 patents)Hidehito SaigusaKouji Mitsuhashi (11 patents)Hidehito SaigusaTaira Takase (11 patents)Hidehito SaigusaShinya Nishimoto (3 patents)Hidehito SaigusaNaoki Takayama (14 patents)Hidehito SaigusaNobuyuki Okayama (12 patents)Hidehito SaigusaHidehito Saigusa (11 patents)Daisuke HayashiDaisuke Hayashi (96 patents)Hiroyuki NakayamaHiroyuki Nakayama (67 patents)Jun OzawaJun Ozawa (33 patents)Kouji MitsuhashiKouji Mitsuhashi (29 patents)Taira TakaseTaira Takase (17 patents)Shinya NishimotoShinya Nishimoto (17 patents)Naoki TakayamaNaoki Takayama (14 patents)Nobuyuki OkayamaNobuyuki Okayama (12 patents)
..
Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Tokyo Electron Limited (11 from 10,326 patents)


11 patents:

1. 8117986 - Apparatus for an improved deposition shield in a plasma processing system

2. 8118936 - Method and apparatus for an improved baffle plate in a plasma processing system

3. 7811428 - Method and apparatus for an improved optical window deposition shield in a plasma processing system

4. 7678226 - Method and apparatus for an improved bellows shield in a plasma processing system

5. 7566368 - Method and apparatus for an improved upper electrode plate in a plasma processing system

6. 7204912 - Method and apparatus for an improved bellows shield in a plasma processing system

7. 7166166 - Method and apparatus for an improved baffle plate in a plasma processing system

8. 7166200 - Method and apparatus for an improved upper electrode plate in a plasma processing system

9. 7163585 - Method and apparatus for an improved optical window deposition shield in a plasma processing system

10. 7137353 - Method and apparatus for an improved deposition shield in a plasma processing system

11. 6798519 - Method and apparatus for an improved optical window deposition shield in a plasma processing system

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