Balzers Aktiengesellschaft

Balzers Patent Und Beteiligungs Ag

Balzers Aktiengesellschaft Fur Hochvakuumtechnik Und Dunne Schichten

Helmut Daxinger

Erich Bergmann

Walter Haag

Eberhard Moll

Rainer Buhl

Hans K Pulker

Jurgen Ramm

Johann Karner

Eduard Kugler

Hans Schulz

A target arrangement for a sputtering apparatus has a circular plate target with either a circumferential protrusion or recess which is symmetrical about a central plane through the target, the plane being perpendicular to the central axis of the target and located halfway between the top and bottom surfaces of the target. Each surface of the target is composed primarily of sputtering material. A magnetron for use with the target arrangement for easy changing of the target to sputter using the opposite surface of the target is disclosed. A process for using the target arrangement and magnetron assembly to sputter a work piece is also disclosed.

Target arrangement with a circular plate, magnetron for mounting the

A vacuum treatment chamber has a sputtering electrode and a counter electrode together defining a plasma discharge area. The counter electrode has an electrode surface area which is not visible from the sputtering electrode. A third electrode, together with the non-visible surface area, defines an auxiliary plasma discharge space. A substantially unencumbered propagative electron path is established between the discharge spaces. A plasma discharge is generated between the sputtering electrode and the counter electrode within a vacuum chamber.

Vacuum treatment chamber

The invention relates to a method for depositing a diamond coating on a workpiece, for instance a drawing die or a tool punch, whereby a reactive plasma supported coating method is used. According to the invention the generation of the plasma is made by a direct current discharge, whereby additionally a flow of charged particles is fed into the discharge gap; according to the invention the workpiece to be coated is positioned in the discharge gap. Due to the inventive design a relatively long discharge gap can be used, such that also large surface areas can be coated; the coating is made at a location of the highest homogeneity and density of the plasma. By means of the invention a method is provided which can be controlled regarding financial expenses and in a reliable manner and which is suitable for large surface area coating.

Plasma CVD method for producing a diamond coating

A coated tool or instrument has a wear-resistant hard coating (7) which is preferably titanium nitride for working organic material which is disposed on a separating layer (9) applied on a basic body (3). The separating layer (9) comprises a ceramic electrically non-conducting material. Such a material is preferably an oxide, nitride or oxynitride of silicon. The separating layer (9) protects the basic body (3) of the tool or instrument of e.g. a non-corrosion resistant steel. During the coating of the basic body (3) with the ceramic material, a pulsating dc voltage is applied to the basic body (3) or its holders. The pulse height is changed during the vapor deposition from high negative values to low negative values.

Tool or instrument with a wear-resistant hard coating for working or

For coating workpieces having basic bodies (3), with a ceramic, electrically non-conducting material, during the coating process a pulsating dc voltage is applied to the basic bodies (3) or their holders (36). Preferably the pulse height is changed during vaporization used for the coating process, from high negative values to smaller negative values. A further layer can be applied onto the workpieces coated in this way whereby these work-pieces, due to their excellent corrosion resistance, are suited as pieces of jewelry which can be exposed in particular to ocean water and body perspiration, as rolling bodies in which the use of oil or grease as corrosion protection can be dispensed with, and as separating and cutting tools for organic materials.

Method of producing coating using negative DC pulses with specified duty

A method of evaporating an evaporative substance under vacuum comprises bombarding the evaporative substance with electrons from a low voltage arc discharge established between a cathode and an anode which is located in an evaporation chamber and simultaneously supplying additional power for evaporation to the evaporative substance by means of an electron gun which produces an electron energy in excess of one keV. A device for carrying out the invention comprises an evacuable bowl, an evaporation chamber with a receptacle therein for a substance to be evaporated and means for establishing a low voltage arc discharge between a cathode and an anode located in the evaporation chamber, a further provision of an electron gun for bombarding the substance with electrons which has an electron energy more than one kilovolt.

Method and apparatus for evaporating material under vacuum using both an

A method of controlling color hues of coatings particularly gold color coatings on substrate using a housing capable of being evacuated, and having an evacuated chamber, a hot cathode chamber in communication with the evacuated chamber and a support structure for the substrate to be coated and a crucible for the material to be evaporated acting as an anode and with a hot cathode in the hot cathode chamber, comprises evaporating the material in the evaporation chamber while maintaining a residual gas atmosphere containing nitrogen therein, producing an electric gas arc discharge between the cathode and the anode of a low voltage, and mixing a carbon containing gaseous compound to the residual gas while applying a negative biasing voltage relative to the housing to the substrate to be coated.

Method for producing gold color coatings

A method of producing gold-color coatings on substrates by evaporating a coating material comprising a metallic titanium or zirconium in a housing which has walls which define an evaporation space, comprises, maintaining a vacuum atmosphere containing N.sub.2 and argon in the space. The method is carried out using an anode connected to a power source to produce a low voltage arc discharge in the vicinity of the coating material which is arranged within the evaporation space and also maintaining a low voltage arc between the anode and the substrates. A potential difference between the anode and the substrates of a range of between 5 v and 100 v are maintained during the process and, in addition, the electrical potential of the substrates is maintained between 0 and 150 volts lower than the potential of the housing walls which define the evaporation space. The substrate to be coated is coated at a rate of from between 1 to 15 nanometers per second. The N.sub.2 and argon atmosphere is maintained so that a partial pressure of the N.sub.2 -containing component ranges between 2.times.10.sup.-4 and 10.sup.-2 millbar. The potential difference between the anode and the substrates is reduced in the course of the process to release the sputtering threshold of the substrate and the housing wall. The partial pressure of the N.sub.2 -containing components continuously increase in the course of the process.

Method of producing gold-color coatings

A method and apparatus for evaporating materials in a vacuum evaporator by bombarding a material to be evaporated with electrons generated by a low voltage arc discharge sustained between a hot cathode and an anode comprising, locating the hot cathode in a chamber which is separated from an evaporation chamber wherein the hot cathode chamber communicates with the evaporation chamber through an aperture, connecting the material to be evaporated as the anode in the evaporation chamber, continuously introducing a gas into the hot cathode chamber while evacuating the evaporation chamber to maintain a pressure differential therebetween, and concentrating the beam of electrons by a magnetic field so as to obtain on the surface of the anode a power density sufficient for evaporation.

Method and apparatus for evaporating materials in a vacuum coating plant

A light transmitting, absorbing coating is produced on a substrate by depositing layers of silicon in an oxidizing residual gas atmosphere and chrome in a non-oxidizing residual gas atmosphere in alternate layers cathode sputtering. The light transmitting layer comprises a substrate having a coating of a bluish-grey transmission color which comprises a plurality of alternate chrome and silicon dioxide layers with the thickness of the individual chrome layers being smaller than 10 nm.

Coating composition for a light transmitting absorbing coating on

A light transmitting, absorbing coating is produced on a substrate by depositing by cathode sputtering alternate layers of silicon in an oxidizing residual gas atmosphere and chrome in a non-oxidizing residual gas atmosphere. The light transmitting layer comprises a substrate having a coating of a bluish-grey transmission color which comprises a plurality of alternate chrome and silicon dioxide layers with the thickness of the individual chrome layers being smaller than 10 nm.

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Wangs, Switzerland

Helmut Daxinger