Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Hitachi Medical Corporation

Hitachi, Ltd.

Other

Hitachi High&#x2014;technologies Corporation

Hitachi Hich-tech Corporation

Hajime Kawano

Hiroyuki Takahashi

Wen Zheng Li

Hideyuki Kazumi

Shahedul Hoque

Yasunari Sohda

Makoto Suzuki

Makoto Sakakibara

Hirotaka Takeshima

Kazuki Ikeda

Toshiyuki Yokosuka

Kumiko Shimizu

Shigeru Kakugawa

Chahn Lee

Noriaki Hino

Momoyo Enyama

Noritsugu Takahashi

Shin Imamura

Ryo Kadoi

Wataru Mori

Haruo Yoda

Yuko Sasaki

Souichi Katagiri

Takeshi Yatsuo

Daisuke Bizen

Takuma Nishimoto

Soichiro Matsunaga

Hiroshi Tazaki

Takashi Doi

Yoshifumi Sekiguchi

Takeyoshi Ohashi

Takafumi Miwa

Takao Honmei

Nobuhiro Hara

Takao Hommei

Muneyuki Fukuda

Hiroyuki Ito

Yoshinobu Kimura

Minoru Yamazaki

Takashi Ohshima

Natsuki Tsuno

Tomonobu Tsuchiya

Kenji Tanimoto

Akiyoshi Komura

Yoshinori Momonoi

Hajime Tanabe

Keigo Kasuya

Kouichi Kurosawa

Yuzuru Mizuhara

Yuji Kasai

Shigenori Kuroda

Hideki Itai

Yutaka Takuma

Kaori Shirahata

Tasuku Yano

Shouji Kitamura

Minoru Wakita

Masato Kamada

Hideo Todokoro

Hiroyuki Takeuchi

Tadashi Otaka

Akira Ikegami

Naomasa Suzuki

Hiroya Ohta

Osamu Komuro

Toshiaki Kusunoki

Yoshiyuki Miyamoto

Masakazu Takahashi

Tomoyasu Shojo

Yasuhiro Shirasaki

Shinichi Murakami

Naoki Maki

Shunsuke Mizutani

Katsunori Onuki

Koichi Kuroda

Hisaaki Kanai

Manabu Yano

Ryoichi Ishii

Kazuma Tanii

Shuhei Ishikawa

Hiroshi Nishihama

Masashi Wada

Tomoharu Nagashima

Hisafumi Imura

Junichiro Tomizawa

Takumu Iwanaka

Aki Takei

Munenori Kotabe

Kiyoshi Fukutomi

To provide a charged particle beam device including a booster electrode and an object lens that generates a magnetic field in a vicinity of a sample, and capable of preventing ion discharge, an insulator is disposed between a magnetic field lens and the booster electrode. A tip of the insulator protrudes to a tip side of an upper magnetic path from a tip of a lower magnetic path of the magnetic field lens. The tip on a lower side of the insulator is above the lower magnetic path, and a non-magnetic metal electrode is embedded between the upper magnetic path and the lower magnetic path.

Charged particle beam device

Provided are a charged particle detector and a radiation detector capable of obtaining an observation image with correct contrast without saturation even when the number of signal electrons incident on a detector is increased due to an increase in the current of a primary electron beam. The charged particle detector is characterized by having a scintillator () having a signal electron detection surface () for detecting signal electrons emitted when a specimen is irradiated with primary electrons and converting the signal electrons into light, a light detector () having a light detection surface () for detecting the light emitted from the scintillator (), and a light guide () disposed between the scintillator () and the light detector (), wherein the area of the light detection surface () is larger than the area of the signal electron detection surface ().

Charged particle detector, charged particle ray device, radiation detector, and radiation detection device

The invention provides a charged particle beam device capable of reducing a positional shift between secondary beams generated in a beam separator. The charged particle beam device includes a charged particle beam source configured to irradiate a sample with a plurality of primary beams, a plurality of detectors configured to detect secondary beams emitted from the sample in correspondence to the primary beams, and a beam separator configured to deflect the secondary beams in a direction different from that of the primary beams. The charged particle beam device further includes a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams generated in the beam separator.

A charged particle beam device includes a plurality of detectors configured to detect one or more signal charged particle beams caused by irradiation on a sample with one or more primary charged particle beams, and a control system. The control system is configured to measure an intensity distribution of the one or more signal charged particle beams detected by the plurality of detectors, and correct the intensity distribution by using a correction function. The control system is configured to generate an image based on the corrected intensity distribution.

Provided is a charged particle beam device for which deterioration in throughput in the event of abnormality of multiple beams can be prevented. The charged particle beam device includes: a stageon which a sample is mounted; a charged particle optical system configured to irradiate the sample with multiple beams including multiple primary beams; a detectorconfigured to detect secondary beams generated by interactions between the primary beams and the sample and output detection signals; and a control unitconfigured to control the stage and the charged particle optical system to generate image data based on the detection signals from the detector obtained by scanning the sample with the multiple beams using a first scanning method. The control unit changes, when the abnormality of the multiple beams is detected based on the image data, the multiple beams to scan the sample using a second scanning method, and a scanning width of the multiple beams for scanning the sample is greater in the second scanning method than in the first scanning method.

Charged particle beam device and inspection method

Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.

When adjusting optical axes of a multi-beam charged particle beam device, because parameters of optical systems are inter-dependent, the time required to adjust the parameters increases. Thus, the present invention provides a charged particle beam device provided with an optical parameter setting unit for setting parameters of optical systems for emitting a plurality of primary charged particle beams to a sample, detectors for individually detecting a plurality of secondary charged particle beams discharged from the sample, a plurality of memories for storing signals detected by the detectors and converted into digital pixels in the form of images, evaluation value derivation units for deriving evaluation values of the primary charged particle beams from the images, and a GUI capable of displaying the images and receiving an input from a user, wherein the GUI displays the images and evaluation results based on the evaluation values and changes various optical parameters in real-time.

Charged particle beam device and operation method therefor

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

To stabilize an emitted electron beam, a thermoelectric field emission electron source includes: an electron source having a needle shape; a metal wire to which the electron source is fixed and configured to heat the electron source; a stem fixed to an insulator and configured to energize the metal wire; a first electrode having a first opening portion and arranged such that a tip of the electron source protrudes from the first opening portion; a second electrode having a second opening portion; and an insulating body configured to position the first electrode and the second electrode such that a central axis of the first opening portion and a central axis of the second opening portion coincide with each other, and to provide electrical insulation between the first and second electrodes, so as to provide a structure that reduces an amount of gas released when the first electrode is heated.

Thermoelectric field emission electron source and electron beam application device

The objective of the present invention is to use brightness images acquired under different energy conditions to estimate the size of a defect in the depth direction in a simple manner. A charged-particle beam device according to the present invention determines the brightness ratio for each irradiation position on a brightness image while changing parameters varying the signal amount, estimates the position of the defect in the depth direction on the basis of the parameters at which the brightness ratio is at a minimum, and estimates the size of the defect in the depth direction on the basis of the magnitude of the brightness ratio (see FIG.).

Charged-particle beam device and cross-sectional shape estimation program

In order to provide an electron gun capable of maintaining a small spot diameter of a beam converged on a sample even when a probe current applied to the sample is increased, a magnetic field generation sourceis provided with respect to an electron gun including: an electron source; an extraction electrodeconfigured to extract electrons from the electron source; an acceleration electrodeconfigured to accelerate the electrons extracted from the electron source; and a first coiland a first magnetic pathhaving an opening on an electron source side, the first coiland the first magnetic pathforming a control lens configured to converge an electron beam emitted from the acceleration electrode. The magnetic field generation source is provided for canceling a magnetic field, at an installation position of the electron source, generated by the first coiland the first magnetic path

Electron gun and electron beam application device

The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG.).

Charged particle ray device and cross-sectional shape estimation program

The objective of the present invention is to provide a charged particle detector and a charged particle beam device with which it is possible to acquire a high luminous output while rapidly eliminating charged particles that are incident to a scintillator. In order to achieve said objective the present invention proposes: a charged particle detector provided with a light-emitting unit including a laminated structure obtained by laminating a GaInN-containing layer and a GaN layer, and provided with a conductive layer that is in contact with the GaInN-containing layer on the charged particle incidence surface side of the laminated structure; and a charged particle beam device.

Charged particle detector including a light-emitting section having lamination structure, charged particle beam device, and mass spectrometer

A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m&#x2265;1), the number m of frames being smaller than the number n of frames.

Charged particle beam device having inspection scan direction based on scan with smaller dose

Growing community of inventors

Tokyo, Japan

Hajime Kawano