Shanghai Micro Electronics Equipment (Group) Co., Ltd.

Haili Jia

Yuebin Zhu

Feihong Liao

Shuping Hu

A fine-motion module for use in a wafer stage of a photolithography tool includes: a base (); a fine-motion plate (); a plurality of vertical motors (), fixed between the base and the fine-motion plate; a plurality of gravity compensators (), each having one end fixed on the base and the other end configured to support the fine-motion plate; a plurality of absolute-position sensors (), configured to measure an absolute position of the fine-motion plate and to adjust pressures in the gravity compensators based on the obtained absolute-position measurements such that the absolute position of the fine-motion plate is changed to a predetermined initial vertical position; and a plurality of relative-position sensors (), configured to measure a relative position of the fine-motion plate to the base and to control the fine-motion plate based on the obtained relative-position measurements, thereby moving the fine-motion plate to a relative zero position.

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Shanghai, China

Haili Jia