Other

Steag Ast

Ast Elektronik Gmbh

Guenter Kaltenbrunner

Zsolt Nenyei

Helmut Sommer

Thomas Knarr

A closable enclosure for rapid thermal processing of semiconductor wafers is presented, wherein the closable enclosure has an enclosed volume less than 10 times the volume of the wafer, and wherein the closable enclosure may be closed about the wafer while the closable enclosure is surrounded by the process gas.

Apparatus and method for rapid thermal processing

A thin visible and near IR absorbing plate is placed between the radiation source and the object to be processed in a rapid thermal processing system. The object is heated in part by the near IR and far IR radiation from the thin plate, and the material and optically induced heating inhomogeneities are reduced.

Method and apparatus for rapid thermal processing

A closable enclosure for rapid thermal processing of semiconductor wafers is presented, wherein the closable enclosure has an enclosed volume less than 10 times the volume of the wafer, and wherein the closable enclosure may closed about the wafer while the closable enclosure is surrounded by the process gas.

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Baldham, Germany

Guenter Kaltenbrunner