East China University of Science and Technology

Acm Research (shanghai) Inc.

Guanzhong Lu

Jun Wang

Jian Wang

Hui Wang

Jun Wu

Fuping Chen

Zhigang Zhang

Zhiyou Fang

Deyun Wang

Yun Guo

An apparatus for cleaning semiconductor wafers includes a plurality of load ports; at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; and one or more single wafer cleaning modules. The apparatus further includes: a first turnover device, configured to rotate the one or more wafers from horizontal plane to vertical plane so that the one or more wafers can be vertically transferred to the at least one first tank; and a second turnover device, configured to rotate the one or more wafers from vertical plane to horizontal plane so that the one or more wafers can be horizontally transferred to the one or more single wafer cleaning modules.

Apparatus and method for cleaning semiconductor wafers

The invention provides an apparatus for cleaning semiconductor wafers. The apparatus includes at least one first tank, containing cleaning chemical, configured to implement batch cleaning process; one or more second tanks, containing cleaning liquid, configured to implement batch cleaning process; one or more single wafer cleaning modules, configured to implement single wafer cleaning and drying processes; a plurality of robots, configured to transfer one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules; and a controller, configured to control the plurality of robots to transfer the one or more wafers to the at least one first tank and the one or more second tanks successively, and then to the one or more single wafer cleaning modules.

A method for preparing monolithic catalyst washcoat is disclosed and includes the following steps: preparing a coating slurry; pretreating a monolithic carrier; applying the coating slurry onto the monolithic carrier by vacuum spraying; removing the excess coating slurry by vacuum extraction; and obtaining the monolithic carrier applied with the washcoat after drying and calcination. The washcoat of 5-20 wt % can be obtained on the monolithic carrier of the present invention by one-off applying. The method can be used to prepare the washcoat on monolithic cordierite ceramic carrier, monolithic metal carrier, monolithic active carbon carrier or monolithic molecular sieve carrier. The obtained washcoat is uniform, and has good adhesion with the carrier and excellent repeatability.

Method for preparing monolithic catalyst washcoat

A close coupled three-way catalyst for purification of exhaust gas of motor vehicle and the preparation thereof. The support is selected from cordierite honeycomb ceramic materials having a pore volume of 0.25-0.35 ml/g. The coating layer is the mixture of hexaaluminate and perovskite-type composite oxide, cerium-zirconium solid solution, rare-earth oxide and alumina, alkali-earth oxide and zeolite having a high Si/Al ratio. The active components are palladium-rhodium, rare-earth oxide and transition metal in the hexaaluminate and perovskite-type composite oxide. The catalyst has not only the function of low-temperature catalytic oxidation of hydrocarbons, but also the function of reduction of nitrogen oxides, and can be used for purifying the exhaust gas of motor vehicles using gasoline, liquid gas, or CNG as fuel.

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Shanghai, China

Guanzhong Lu