Fei Comapny

Gijs Van Duinen

Ivan Lazic

Peter Christiaan Tiemeijer

Bart Buijsse

Bart Jozef Janssen

Uwe Luecken

Gerbert Jeroen Van De Water

Stephanus Hubertus Leonardus Van Den Boom

Fotios Sakellariou

Ross Savage

Stephanus Hl Van Den Boom

Roland W P Jonkers

Roland Wilhelmus Pieter Jonkers

Stephanus H L Van Den Boom

Steijn Van Den Boom

A method of examining a cryogenic specimen in a Charged Particle Microscope, comprising:

Cryogenic cell for mounting a specimen in a charged particle microscope

When preparing a Hole-Free Phase Plates (HFPP) a preferably featureless thin film should be placed with high accuracy in the diffraction plane of the TEM, or a plane conjugate to it. Two methods for accurately placing the thin film in said plane are described. One method uses a Ronchigram of the thin film while the TEM is in imaging mode, and the magnification of the Ronchigram is tuned so that the magnification in the middle of the Ronchigram is infinite. The second method uses electrons scattered by the thin film while the TEM is in diffraction mode. When the thin film does not coincide with the diffraction plane, electrons scattered by the thin film seem to originate from another location than the cross-over of the zero beam. This is observed as a halo. The absence of the halo is proof that the thin film coincides with the diffraction plane.

Aligning a featureless thin film in a TEM

A method of investigating a wavefront of a charged-particle beam that is directed from a source through an illuminator so as to traverse a sample plane and land upon a detector, an output of the detector being used in combination with a mathematical reconstruction technique so as to calculate at least one of phase information and amplitude information for the wavefront at a pre-defined location along its path to the detector, in which method:

Method of investigating the wavefront of a charged-particle beam

A system of investigating aberrations in a charged particle lens system, wherein a charged particle beam is directed from a multitude of directions through a pivot point on a sample stage. An image figure is recorded for each of multiple focus settings at each beam direction setting, creating a set of registered images. This set of images is compared to reference images to derive aberrations present in the lens system without the use of an amorphous sample present.

Method of investigating and correcting aberrations in a charged-particle lens system

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Utrecht, Netherlands

Gijs Van Duinen