Growing community of inventors

Veldhoven, Netherlands

Georgi Nenchev Nenchev

Average Co-Inventor Count = 1.00

ph-index = NA

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 0

Georgi Nenchev NenchevMarcus Adrianus Van De Kerkhof (1 patent)Georgi Nenchev NenchevRichard Joseph Bruls (1 patent)Georgi Nenchev NenchevYang-Shan Huang (1 patent)Georgi Nenchev NenchevOlav Waldemar Vladimir Frijns (1 patent)Georgi Nenchev NenchevRonald Peter Albright (1 patent)Georgi Nenchev NenchevZhuangxiong Huang (1 patent)Georgi Nenchev NenchevManish Ranjan (1 patent)Georgi Nenchev NenchevKursat Bal (1 patent)Georgi Nenchev NenchevParham Yaghoobi (1 patent)Georgi Nenchev NenchevKarl Robert Umstadter (1 patent)Georgi Nenchev NenchevSjoerd Frans De Vries (1 patent)Georgi Nenchev NenchevThomas Maarten Raasveld (1 patent)Georgi Nenchev NenchevEray Uzgören (1 patent)Georgi Nenchev NenchevVadim Yevgenyevich Joseph Banine (1 patent)Georgi Nenchev NenchevGeorgi Nenchev Nenchev (1 patent)Marcus Adrianus Van De KerkhofMarcus Adrianus Van De Kerkhof (105 patents)Richard Joseph BrulsRichard Joseph Bruls (36 patents)Yang-Shan HuangYang-Shan Huang (21 patents)Olav Waldemar Vladimir FrijnsOlav Waldemar Vladimir Frijns (20 patents)Ronald Peter AlbrightRonald Peter Albright (7 patents)Zhuangxiong HuangZhuangxiong Huang (7 patents)Manish RanjanManish Ranjan (7 patents)Kursat BalKursat Bal (4 patents)Parham YaghoobiParham Yaghoobi (3 patents)Karl Robert UmstadterKarl Robert Umstadter (2 patents)Sjoerd Frans De VriesSjoerd Frans De Vries (1 patent)Thomas Maarten RaasveldThomas Maarten Raasveld (1 patent)Eray UzgörenEray Uzgören (1 patent)Vadim Yevgenyevich Joseph BanineVadim Yevgenyevich Joseph Banine (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Asml Netherlands B.v. (1 from 4,836 patents)

2. Asml Holding N.v. (1 from 613 patents)


1 patent:

1. 12332570 - Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

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