Novellus Systems Incorporated

George D Papasoulitotis

Bart Jan Van Schravendijk

Vikram Singh

Vishal Gauri

Md Sazzadur Rahman

Atiye Bayman

Weijie Zhang

Chemical vapor deposition processes are employed to fill high aspect ratio (typically at least 3:1), narrow width (typically 1.5 microns or less and even sub 0.15 micron) gaps with significantly reduced incidence of voids or weak spots. This deposition process involves the use of hydrogen as a process gas in the reactive mixture of a plasma containing CVD reactor. The process gas also includes dielectric forming precursor molecules such as silicon and oxygen containing molecules.

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Cupertino, CA, United States of America

George D Papasoulitotis