Hewlett-packard Company

Varian Associates, Inc.

Garrett A Garrettson

Armand P Neukermans

James H Boyden

James Bernard Kruger

Donald R Bradbury

Lawrence R Hanlon

Graham J Siddall

Steven G Eaton

Timothy R Groves

An aligner for aligning a mask and a wafer during photolithography of a semiconductor chip uses detection of the differential capacitance between two sets of conductive fingers on the mask and ridges on the wafer. An A.C. signal is coupled between the ridges and the fingers and the phase or amplitude of the signals is detected. An aligner utilizing multiple groups of ridges and fingers allows rotational alignment or two axis lateral alignment. An aligner having reference ledges to which the mask and the wafer are capacitively coupled allows alignment when the distance between the mask and the wafer is too great to permit meaningful capacitive coupling between the mask and the wafer to occur.

Capacitive mask aligner

An X-ray lithography apparatus permits the successive exposure of each of four quadrants of a semiconductor wafer through a single mask. The mask overlays one quadrant of the wafer at a time and the wafer is rotated through 90 degrees after exposure of a quadrant to allow exposure of succeeding wafer quadrants; each wafer quadrant is independently aligned to the mask prior to exposure. In an alternative preferred embodiment, a rotatable diaphragm is used to select a single mask quadrant from a mask which overlays the entire surface of the semiconductor wafer. Both the wafer and the diaphragm may be rotated to allow various exposure combinations of mask and wafer quadrants.

Method and apparatus for lithographic rotate and repeat processing

A new type of thermal ink jet print head is provided which is driven by an electron beam. The print head is constructed of an electron permeable thin film (electron window) which in one embodiment, has on one of its surfaces a plurality of electron absorbing (heater) pads that are in thermal contact with an ink reservoir. As electrons from a CRT traverse the thin film and are absorbed by a pad, they introduce an extremely large and rapid temperature increase in the pad. As a result, a sufficient amount of thermal energy is absorbed by the ink to cause a vapor explosion within the ink, thereby ejecting ink droplets from a nearby orifice in the ink reservoir. In another embodiment, the electrons traverse the window and are absorbed in the ink rather than in pads, and in another embodiment the electrons are absorbed directly in the window itself.

Electron beam driven ink jet printer

Growing community of inventors

Los Altos Hills, CA, United States of America

Garrett A Garrettson