Carl Zeiss Smt Gmbh

Florian Baumer

Matthias Manger

Ulrich Mueller

Daniel Runde

Christoph Petri

A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.

Metrology system and method for measuring an excitation laser beam in an EUV plasma source

An apparatus includes a light intensity sensor arrangement, a focusing unit for focusing the light beam at a specified location on the light intensity sensor arrangement, and an adjustment unit which adjusts a relative position of the intensity centroid of the light beam in relation to a specified location on the light intensity sensor arrangement when there is a change in the beam angle present upon entry in the apparatus. The adjustment unit is configured to keep the relative position of the intensity centroid of the light beam in relation to the specified location on the light intensity sensor arrangement constant up to a specified maximum deviation. The maximum deviation corresponds to half the mean beam diameter upon incidence on the light intensity sensor arrangement.

Device and method for measuring the beam angle of a light beam guided by a beam guiding optical unit

When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (). Position- and orientation data of the removed mirror for replacement are measured () by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured () using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked () on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

Method for replacing a mirror in a projection exposure apparatus, and position- and orientation data measuring device for carrying out the method

A method for restoring an illumination system installed in an EUV apparatus is provided.

Method for restoring an illumination system for an EUV apparatus, and detector module

A system and a method for analyzing a light beam guided by a beam guiding optical unit. The system has a graduated neutral density filter arrangement (), which is arranged in a far field plane of the beam guiding optical unit and has at least one graduated neutral density filter () having a spatially varying transmission, and a light intensity sensor arrangement having at least one light intensity sensor (), which is arranged in a near field plane of the beam guiding optical unit and is configured to measure (), for each graduated neutral density filter () of the graduated neutral density filter arrangement (), a light intensity transmitted by each graduated neutral density filter.

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Oberkochen, Germany

Florian Baumer