Carl Zeiss Smt Gmbh

Florian Bach

Armin Werber

Yim-Bun Patrick Kwan

Markus Deguenther

Johannes Wangler

Damian Fiolka

Michael Patra

Manfred Maul

Stefan Xalter

Michael Layh

Jan Horn

Johannes Eisenmenger

Andras G Major

Severin Waldis

Daniel Benz

Norbert Muehlberger

Udo Dinger

Martin Endres

Sascha Bleidistel

Berndt Warm

Dirk Heinrich Ehm

Juergen Fischer

Ulrich Schoenhoff

Wilfried Noell

Jasper Wesselingh

Stefan Wiesner

Dieter Kraus

Michael Erath

Yim-Bun-Patrick Kwan

Markus Degünther

András G Major

Rodolfo Rabe

Jürgen Fischer

Dirk Eicher

Thomas Rohe

Norbert MÜHLBERGER

A facet mirror is to be used as a bundle-guiding optical component in a projection exposure apparatus for microlithography. The facet mirror has a plurality of separate mirrors. For individual deflection of incident illumination light, the separate mirrors are in each case connected to an actuator in such a way that they are separately tiltable about at least one tilt axis. A control device, which is connected to the actuators, is configured in such a way that a given grouping of the separate mirrors can be grouped into separate mirror groups that include in each case at least two separate mirrors. The result is a facet mirror which, when installed in the projection exposure apparatus, increases the variability for setting various illumination geometries of an object field to be illuminated by the projection exposure apparatus. Various embodiments of separate mirrors for forming the facet mirrors are described.

Facet mirror for use in a projection exposure apparatus for microlithography

Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Microlithographic projection exposure apparatus

An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising a weight force compensation device for exerting a compensation force on the optical element, wherein the compensation force at least partly compensates for the weight force acting on the optical element, wherein the weight force compensation device has a passive magnetic circuit for generating a force component of the compensation force acting on the optical element, and wherein at least one adjustment element is provided via which the force component generated by the passive magnetic circuit is continuously adjustable.

Arrangement for mounting an optical element

An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators that are supported by the modulator substrate and are configured to tilt the mirrors individually.

Light modulator and illumination system of a microlithographic projection exposure apparatus

An individual mirror is used to construct a facet mirror. A mirror body of the individual mirror is configured to be tiltable relative to a rigid carrier body about at least one tilting axis of a tilting joint. The tilting joint is configured as a solid-body joint. The solid-body joint, perpendicular to the tilting axis, has a joint thickness S and, along the tilting axis, a joint length L. The following applies: L/S&#x3e;50. The result is an individual mirror to construct a facet mirror, which can be reproduced and is precisely adjustable and simultaneously ensures adequate heat removal, in particular, heat produced by residually absorbed useful radiation, which is reflected by the individual mirror, by dissipation of the heat by the mirror body.

Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography

A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

Mirror for guiding a radiation bundle

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Oberkochen, Germany

Florian Bach