Asml Netherlands B.v.

Asml Netherlands B.v. & Asml Holding N.v.

Filippo Alpeggiani

Sebastianus Adrianus Goorden

Simon Reinald Huisman

Stephen Roux

Henricus Petrus Maria Pellemans

Sergei Sokolov

Arjan Johannes Anton Beukman

A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.

Lithographic apparatus, metrology systems, and methods thereof

Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.

Metrology method and lithographic apparatuses

Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.

Alignment method

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Eindhoven, Netherlands

Filippo Alpeggiani