Taiwan Semiconductor Manufacturing Comp. Ltd.

Feng-Tao Lee

Tung-Ching Tseng

Sung-Po Yang

Shih Fang Chen

An apparatus for wafer processing includes a wafer pedestal configured to support a wafer, a radiation source configured to provide an electromagnetic radiation to the wafer, and a transparent window disposed between the wafer pedestal and the radiation source. The transparent window has a first zone having a first rough surface, and an Ra value of the first rough surface is between approximately 0.5 &#x3bc;m and approximately 100 &#x3bc;m. The apparatus for wafer processing further includes a primary reflector disposed in the radiation source, and a secondary reflector disposed between the transparent window and the radiation source. The rough surface can be provided over the transparent window, the primary reflector, and/or the secondary reflector.

Growing community of inventors

Miaoli County, Taiwan

Feng-Tao Lee