Intel Corporation

Other

Fay Hua

Carl L Deppisch

Thomas John Fitzgerald

Johanna M Swan

Telesphor Kamgaing

Ting Zhong

Adel A Elsherbini

Mark T Bohr

Gregory Martin Chrysler

James G Maveety

Tom Fitzgerald

Henning Braunisch

Sasha N Oster

Kramadhati V Ravi

Krishna Seshan

Paul A Koning

Sabina J Houle

Hong Xie

Dustin P Wood

Jun He

Gregorio R Murtagian

Joni G Hansen

Alan C McAllister

Youzhi E Xu

Kevin Jeng

Albert T Wu

Amit Abraham

Georgios C Dogiamis

Valluri Ramana Rao

Valery M Dubin

Zhichao Zhang

Kevin J Lee

Wei Shi

Sidharth Dalmia

Brandon M Rawlings

Christopher M Pelto

Susheel G Jadhav

Ming Fang

Michael C Garner

C Michael Garner

Peter D Brandenburger

Aranzazu Maestre Caro

Jianxing Li

Mike Gasparek

Krista J Whittenburg

Kris J Whittenburg

Kim L Phillippe

Kristopher E Dayton

An apparatus is provided which comprises: a planar dielectric surface, two or more conductive leads on the surface, the conductive leads extending away from the substrate surface, two or more conductive traces on the surface between the conductive leads, the traces substantially parallel to each other, and a wire coupling a first end of a first conductive trace to an opposite end of an adjacent second conductive trace, the wire extending away from the surface. Other embodiments are also disclosed and claimed.

Device with out-plane inductors

Embodiments of the present disclosure describe techniques for fabricating a stacked integrated circuit (IC) device. A first wafer that includes a plurality of first IC dies may be sorted to identify first known good dies of the plurality of first IC dies. The first wafer may be diced to singulate the first IC dies. A second wafer that includes a plurality of second IC dies may be sorted to identify second know good dies of the plurality of second IC dies. The first known good dies may be bonded to respective second known good dies of the second wafer. In some embodiments, the first known good dies may be thinned after bonding the first know good dies to the second wafer. Other embodiments may be described and/or claimed.

Techniques for die stacking and associated configurations

Embodiments include devices and methods, including a device including a substrate comprising a semiconductor, the substrate including a front side comprising active elements and a backside opposite the front side. The device includes a dielectric layer on the backside, and a passive component on the dielectric layer on the backside. In certain embodiments, the passive device is formed on a self-assembled monolayer (SAM). Other embodiments are described and claimed.

System on package architecture including structures on die back side

Embodiments include devices and methods, including a method for processing a substrate. The method includes providing a substrate including a first portion and a second portion, the first portion including a feature, the feature including an electrically conductive region, the second portion including a dielectric surface region. The method also includes performing self-assembled monolayer (SAM) assisted structuring plating to form a structure comprising a metal on the dielectric surface region, the feature being formed using a process other than the SAM assisted structuring plating used to form the structure, and the structure being formed after the feature. Other embodiments are described and claimed.

Electronic devices with components formed by late binding using self-assembled monolayers

A method including activating an area of a polymer layer on a substrate with electromagnetic radiation; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with the self-assembled monolayer; and reacting the self-assembled monolayer with a conductive material. A method including activating an area of a polymer dielectric layer on a substrate with electromagnetic radiation, the area selected for an electrically conductive line; modifying the activated area; forming a self-assembled monolayer on the modified active area; reacting the self-assembled monolayer with a catalyst; and electroless plating a conductive material on the self-assembled monolayer.

Sam assisted selective e-less plating on packaging materials

Embodiments are generally directed to non-planar on-package via capacitor. An embodiment of an embedded capacitor includes a first plate that is formed in a package via; a dielectric layer that is applied on the first plate; and a second plate that is formed in a cavity in the dielectric layer, wherein the first plate and the second plate are non-planar plates.

Non-planar on-package via capacitor

Embodiments of the present disclosure are directed towards techniques and configurations to provide solder contacts for electrical connection in socket assemblies. In one embodiment, a solder contact may be disposed on the bottom surface of a die package such that the solder contact is conductively coupled to electrical contacts of the die package. The solder contacts may be disposed to be coupled to pins of a socket assembly, to provide conductive coupling of the electrical contacts of the die package and the pins of the socket assembly. The solder may be selected to be sufficiently soft to provide for better electrical conduction. The pins may also be configured to penetrate the solder contact to provide for better electrical conduction. Other embodiments may be described and/or claimed.

Solder contacts for socket assemblies

Methods of forming microelectronic package structures are described. Those methods/structures may include forming a high density region on a board comprising a first plurality of conductive structures disposed on a dielectric material on the board, wherein the first plurality of conductive structures comprises a first pitch between individual ones of the first plurality of conductive structures. A low density region on the board comprises a second plurality of conductive structures disposed on the dielectric material, wherein the second plurality of conductive structures comprises a second pitch between individual ones of the second plurality of conductive structures, wherein the second pitch is more than about twice the magnitude of the first pitch.

Local dense patch for board assembly utilizing laser structuring metallization process

A method and apparatus to minimize thermal impedance using copper on the die or chip backside. Some embodiments use deposited copper having a thickness chosen to complement a given chip thickness, in order to reduce or minimize wafer warpage. In some embodiments, the wafer, having a plurality of chips (e.g., silicon), is thinned (e.g., by chemical-mechanical polishing) before deposition of the copper layer, to reduce the thermal resistance of the chip. Some embodiments further deposit copper in a pattern of bumps, raised areas, or pads, e.g., in a checkerboard pattern, to thicken and add copper while reducing or minimizing wafer warpage and chip stress.

Apparatus to minimize thermal impedance using copper on die backside

A nano-sized metal particle composite includes a first metal that has a particle size of about 50 nanometer or smaller. A wire interconnect is in contact with a reflowed nanosolder and has the same metal or alloy composition as the reflowed nanosolder. A microelectronic package is also disclosed that uses the reflowed nanosolder composition. A method of assembling a microelectronic package includes preparing a wire interconnect template. A computing system includes a nanosolder composition coupled to a wire interconnect.

Electromigration-resistant and compliant wire interconnects, nano-sized solder compositions, systems made thereof, and methods of assembling soldered packages

A method includes providing a mixture of molten indium and molten aluminum, and agitating the mixture while reducing its temperature until the aluminum changes from liquid phase to solid phase, forming particles distributed within the molten indium. Agitation of the mixture sufficiently to maintain the aluminum substantially suspended in the molten aluminum continues while further reducing the temperature of the mixture until the indium changes from a liquid phase to a solid phase. A metallic composition is formed, including indium and particles of aluminum suspended within the indium, the aluminum particles being substantially free from oxidation. The metallic (solder) composition can be used to form an assembly, including an integrated circuit (IC) device, at least a first thermal component disposed adjacent to the IC device, and a solder TIM interposed between and thermally coupled with each of the IC device and the first thermal component.

Composite solder TIM for electronic package

A ball-limiting metallurgy (BLM) stack is provided for an electrical device. The BLM stack resists tin migration toward the metallization of the device. A solder system is also provided that includes a eutectic-Pb solder on a substrate that is mated to a high-Pb solder, and that withstands higher temperature reflows and other higher temperature processes.

Ball-limiting metallurgies, solder bump compositions used therewith, packages assembled thereby, and methods of assembling same

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Fremont, CA, United States of America

Fay Hua