Kla Tencor Corporation

Kla-tencor Technologies Corporation

Erik N Johnson

Lawrence Robert Miller

James A Smith

Edward M Goldberg

Disclosed is an apparatus for analyzing a plurality of image portions of at least a region of a sample. The apparatus includes a plurality of processors arranged to receive and analyze at least one of the image portions, and the processors being arranged to operate in parallel. The apparatus also includes a data distribution system arranged to receive image data, select at least a first processor for receiving a first image from the image data, select at least a second processor for receiving a second image from the image data, and output the first and second image portions to their selected processors.

Method and apparatus for inspecting reticles implementing parallel processing

Techniques for detecting defects on semiconductor wafers are described. The techniques involve a parallel processing system wherein a data distribution system contains data distribution nodes that are interconnected by multiple data transfer paths. This configuration allows data collected by any of the detectors to be routed to any one of a plurality of processing nodes. This in turn allows a variety of defect analysis algorithms to be implemented.

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Santa Clara, CA, United States of America

Erik N Johnson