Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Erich Schubert

Markus Deguenther

Michael Patra

Michael Layh

Alexander Kohl

Gerhard-Wilhelm Ziegler

Wolfgang Singer

Joachim Hainz

Johannes Wangler

Bernhard Gellrich

Bernhard Geuppert

Martin Antoni

Markus Weiss

Frank Melzer

Wilhelm Egle

Joachim Wietzorrek

Markus Degünther

An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

Illumination system for illuminating a mask in a microlithographic exposure apparatus

An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially &#x2266;193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

Illumination system particularly for microlithography

There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength &#x2266;193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Collector with fastening devices for fastening mirror shells

Growing community of inventors

Ellwangen, Germany

Erich Schubert