Texas Instruments Corporation

Eric Robert Trumbauer

David Matthew Smith

David Matthew Curran

Ronald Charles Roth

Brian P Scott

Michael Jay Jenson

Brant William Paquette

Jon Evan Button

Vince Christian Samek

Charles David Gordon

A method of providing a semiconductor device and a computer-readable medium having instructions for performing the method are disclosed. The method includes receiving a first wafer defect map that defines comparison regions and identifies visual defect locations for a wafer. A format of the comparison regions is determined, with the format chosen from a group including die-to-die, partial-shot-to-partial-shot and full-shot-to-full-shot. If the comparison format is not die-to-die, mapping information is received that provides die locations within the comparison regions. A wafer layout map is provided that identifies die locations within the wafer.

System and method for electronic die inking after automatic visual defect inspection

A method of patterning a metal layer that cleans the residue from a metal etch process without removing a photoresist etch mask. The method is particularly useful for the fabrication of micromirror devices, or other MEMS devices that use photoresist spacer layers. A photoresist layer is spun on to the mirror metal layer in step The photoresist is patterned and developed in step to form openings to the metal layer. The openings define areas where the mirror metal layer will be removed. The patterned photoresist is inspected in step The mirror metal layer is etched in step using the patterned photoresist layer as an etch mask. After the mirror metal has been etched, the webbing and other residues are removed in a clean up process that uses photoresist developer as a solvent to remove the webbing. After the developer clean up process, the mirrors are inspected in step to verify the proper gaps have been etched between the mirrors and the removal of the mirror etch residue. A photoresist saw prep coating is then spun onto the wafer in step the wafers are sawn in step and scrubbed in step before the mirrors are undercut in step The undercut process removes the photoresist spacer layers on which the hinge yoke and mirror have been fabricated, allowing mirrors to rotate about the torsion hinges.

Post metal etch clean process using soft mask

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Celina, TX, United States of America

Eric Robert Trumbauer